High performance thin film IGZO Schottky diodes with sputtered PdOx anode

Shiqi Yan, Yiming Wang, Jiawei Zhang, Qian Xin, Aimin Song

Research output: Contribution to journalArticlepeer-review

Abstract

Thin film Schottky barrier diodes (SBDs) based on amorphous oxide semiconductors play an important role in flexible and wearable electronics. In this work, thin film SBDs based on indium-gallium-zinc-oxide (InGaZnO or IGZO) were fabricated with sputtered PdOx/Pd top Schottky contact and low temperature (100 ℃ ) annealing in air atmosphere. The PdOx produces an oxygen-rich stoichiometry in the Schottky interface, resulting in high quality contact with rather low interface trap state density of 2.6×1017 cm-3 and extremely low barrier inhomogeneity of 0.01 eV. As a result, high performance IGZO SBDs were achieved with high on/off ratio of 3×107, near-unity ideality factor of 1.04, barrier height of 0.85 eV, high on-current density of 2.5 A·cm-2 at 1 V, and high reverse breakdown voltage of ~12 V.
Original languageEnglish
JournalIEEE Transactions on Electron Devices
Publication statusAccepted/In press - 1 Jul 2021

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