High resolution magnetic force microscopy study of e-beam lithography patterned CoPt nanodots

B. D. Belle; F. Schedin; N. Pilet; T. V. Ashworth; E. W. Hill; P. W. Nutter; H. J. Hug; J. J. Miles

doi:10.1063/1.2713429

High resolution magnetic force microscopy study of e-beam lithography patterned CoPt nanodots

B. D. Belle, F. Schedin, N. Pilet, T. V. Ashworth, E. W. Hill, P. W. Nutter, H. J. Hug, J. J. Miles

Research output: Contribution to journal › Article › peer-review

Abstract

E-beam lithography has been used to pattern a continuous CoPt multilayer film with perpendicular anisotropy into circular islands of various sizes down to 25 nm diameter on a 60 nm pitch. High resolution magnetic force microscopy with in situ applied field has been used to directly determine the switching field distribution (SFD) and hysteresis loop of the islands. For the smallest islands, the coercivity is reduced and the width of the SFD is increased, indicating that they would not be well suited to data storage applications. © 2007 American Institute of Physics.

Original language	English
Article number	09F517
Journal	Journal of Applied Physics
Volume	101
Issue number	9
DOIs	https://doi.org/10.1063/1.2713429
Publication status	Published - 2007

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title = "High resolution magnetic force microscopy study of e-beam lithography patterned CoPt nanodots",

abstract = "E-beam lithography has been used to pattern a continuous CoPt multilayer film with perpendicular anisotropy into circular islands of various sizes down to 25 nm diameter on a 60 nm pitch. High resolution magnetic force microscopy with in situ applied field has been used to directly determine the switching field distribution (SFD) and hysteresis loop of the islands. For the smallest islands, the coercivity is reduced and the width of the SFD is increased, indicating that they would not be well suited to data storage applications. {\textcopyright} 2007 American Institute of Physics.",

author = "Belle, {B. D.} and F. Schedin and N. Pilet and Ashworth, {T. V.} and Hill, {E. W.} and Nutter, {P. W.} and Hug, {H. J.} and Miles, {J. J.}",

year = "2007",

doi = "10.1063/1.2713429",

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AU - Belle, B. D.

AU - Schedin, F.

AU - Pilet, N.

AU - Ashworth, T. V.

AU - Hill, E. W.

AU - Nutter, P. W.

AU - Hug, H. J.

AU - Miles, J. J.

PY - 2007

Y1 - 2007

N2 - E-beam lithography has been used to pattern a continuous CoPt multilayer film with perpendicular anisotropy into circular islands of various sizes down to 25 nm diameter on a 60 nm pitch. High resolution magnetic force microscopy with in situ applied field has been used to directly determine the switching field distribution (SFD) and hysteresis loop of the islands. For the smallest islands, the coercivity is reduced and the width of the SFD is increased, indicating that they would not be well suited to data storage applications. © 2007 American Institute of Physics.

AB - E-beam lithography has been used to pattern a continuous CoPt multilayer film with perpendicular anisotropy into circular islands of various sizes down to 25 nm diameter on a 60 nm pitch. High resolution magnetic force microscopy with in situ applied field has been used to directly determine the switching field distribution (SFD) and hysteresis loop of the islands. For the smallest islands, the coercivity is reduced and the width of the SFD is increased, indicating that they would not be well suited to data storage applications. © 2007 American Institute of Physics.

U2 - 10.1063/1.2713429

DO - 10.1063/1.2713429

M3 - Article

SN - 1089-7550

VL - 101

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 9

M1 - 09F517

ER -

High resolution magnetic force microscopy study of e-beam lithography patterned CoPt nanodots

Abstract

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