Highly Optimized Complementary Inverters Based on p-SnO and n-InGaZnO With High Uniformity

Jin Yang, Yiming Wang, Yunpeng Li, Yuzhuo Yuan, Zhenjia Hu, Pengfei Ma, Li Zhou, Qingpu Wang, Aimin Song, Qian Xin

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Abstract

Oxide semiconductors are desirable for large-area and/or flexible electronics. Here, we report highly optimized complementary inverters based on n-type indium-gallium-zinc oxide and p-type tin monoxide thin-film transistors. Oxide-based inverters with a record voltage gain of 142 have been achieved. The switching point voltage has also been tuned to reach the ideal value, namely half value of the supply voltage. A narrow transition width of 1.04 V (13% of the supply voltage) is achieved which offers a strong anti-jamming ability to avoid logic errors. Rail-to-rail output voltage swing has been achieved. The inverters still maintain high performance at a low supply voltage of 6 V. A very large number of inverters have been fabricated and showed excellent uniformity in a working area of 1 cm. The switching point voltage and transition width show very small standard deviations of only 0.55% (0.022 V) and 2.3% (0.024 V), respectively, demonstrating promises for large-scale circuit integration.

Original languageEnglish
Pages (from-to)516-519
Number of pages4
JournalIEEE Electron Device Letters
Volume39
Issue number4
Early online date26 Feb 2018
DOIs
Publication statusPublished - Apr 2018

Keywords

  • Complementary inverter
  • indium gallium zinc oxide (IGZO)
  • noise margin
  • static voltage gain
  • thin-film transistor (TFT)
  • tin monoxide (SnO)
  • uniformity

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