Highly 28Si Enriched Silicon by Localised Focused Ion Beam Implantation

Ravi Acharya*, Maddison Coke, Mason Adshead, Kexue Li, Barat Achinuq, Rongsheng Cai, A. Baset Gholizadeh, Janet Jacobs, Jessica L. Boland, Sarah J. Haigh, Katie L. Moore, David N. Jamieson, Richard J. Curry*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

Solid-state spin qubits within silicon crystals at mK temperatures show great promise in the realisation of a fully scalable quantum computation platform. Qubit coherence times are limited in natural silicon owing to coupling to the 29Si isotope which has a non-zero nuclear spin. This work presents a method for the depletion of 29Si in localised volumes of natural silicon wafers by irradiation using a 45 keV 28Si focused ion beam with fluences above 1×1019 ions cm−2. Nanoscale secondary ion mass spectrometry analysis of the irradiated volumes shows residual 29Si concentration down to 2.3 ± 0.7 ppm and with residual C and O comparable to the background concentration in the unimplanted wafer. After annealing, transmission electron microscopy lattice images confirm the solid phase epitaxial re-crystallization of the as-implanted amorphous enriched volume extending over 200 nm in depth.
Original languageEnglish
Article number57
JournalCommunications Materials
Volume5
Issue number1
DOIs
Publication statusPublished - 7 May 2024

Research Beacons, Institutes and Platforms

  • National Graphene Institute
  • Henry Royce Institute

Fingerprint

Dive into the research topics of 'Highly 28Si Enriched Silicon by Localised Focused Ion Beam Implantation'. Together they form a unique fingerprint.

Cite this