In Situ Characterization of Alloy Catalysts for Low-Temperature Graphene Growth

Robert S. Weatherup; Bernhard C. Bayer; Raoul Blume; Caterina Ducati; Carsten Baehtz; Robert Schloegl; Stephan Hofmann

doi:10.1021/nl202036y

In Situ Characterization of Alloy Catalysts for Low-Temperature Graphene Growth

Robert S. Weatherup, Bernhard C. Bayer, Raoul Blume, Caterina Ducati, Carsten Baehtz, Robert Schloegl, Stephan Hofmann

Research output: Contribution to journal › Article › peer-review

Abstract

Low-temperature (∼450 °C), scalable chemical vapor deposition of predominantly monolayer (74%) graphene films with an average D/G peak ratio of 0.24 and domain sizes in excess of 220 μm2 is demonstrated via the design of alloy catalysts. The admixture of Au to polycrystalline Ni allows a controlled decrease in graphene nucleation density, highlighting the role of step edges. In situ, time-, and depth-resolved X-ray photoelectron spectroscopy and X-ray diffraction reveal the role of subsurface C species and allow a coherent model for graphene formation to be devised.

Original language	English
Pages (from-to)	4154-4160
Journal	Nano Letters
Volume	11
Issue number	10
DOIs	https://doi.org/10.1021/nl202036y
Publication status	Published - 9 Sept 2011

Keywords

Graphene
chemical vapor deposition (CVD)
alloy catalyst
in situ metrology
XPS
XRD

Access to Document

10.1021/nl202036y

Cite this

@article{8de5094ce0c4461d8336305f2ab3ee3b,

title = "In Situ Characterization of Alloy Catalysts for Low-Temperature Graphene Growth",

abstract = "Low-temperature (∼450 °C), scalable chemical vapor deposition of predominantly monolayer (74%) graphene films with an average D/G peak ratio of 0.24 and domain sizes in excess of 220 μm2 is demonstrated via the design of alloy catalysts. The admixture of Au to polycrystalline Ni allows a controlled decrease in graphene nucleation density, highlighting the role of step edges. In situ, time-, and depth-resolved X-ray photoelectron spectroscopy and X-ray diffraction reveal the role of subsurface C species and allow a coherent model for graphene formation to be devised.",

keywords = "Graphene, chemical vapor deposition (CVD), alloy catalyst, in situ metrology, XPS, XRD",

author = "Weatherup, {Robert S.} and Bayer, {Bernhard C.} and Raoul Blume and Caterina Ducati and Carsten Baehtz and Robert Schloegl and Stephan Hofmann",

year = "2011",

month = sep,

day = "9",

doi = "10.1021/nl202036y",

language = "English",

volume = "11",

pages = "4154--4160",

journal = "Nano Letters",

issn = "1530-6984",

publisher = "American Chemical Society",

number = "10",

}

TY - JOUR

T1 - In Situ Characterization of Alloy Catalysts for Low-Temperature Graphene Growth

AU - Weatherup, Robert S.

AU - Bayer, Bernhard C.

AU - Blume, Raoul

AU - Ducati, Caterina

AU - Baehtz, Carsten

AU - Schloegl, Robert

AU - Hofmann, Stephan

PY - 2011/9/9

Y1 - 2011/9/9

N2 - Low-temperature (∼450 °C), scalable chemical vapor deposition of predominantly monolayer (74%) graphene films with an average D/G peak ratio of 0.24 and domain sizes in excess of 220 μm2 is demonstrated via the design of alloy catalysts. The admixture of Au to polycrystalline Ni allows a controlled decrease in graphene nucleation density, highlighting the role of step edges. In situ, time-, and depth-resolved X-ray photoelectron spectroscopy and X-ray diffraction reveal the role of subsurface C species and allow a coherent model for graphene formation to be devised.

AB - Low-temperature (∼450 °C), scalable chemical vapor deposition of predominantly monolayer (74%) graphene films with an average D/G peak ratio of 0.24 and domain sizes in excess of 220 μm2 is demonstrated via the design of alloy catalysts. The admixture of Au to polycrystalline Ni allows a controlled decrease in graphene nucleation density, highlighting the role of step edges. In situ, time-, and depth-resolved X-ray photoelectron spectroscopy and X-ray diffraction reveal the role of subsurface C species and allow a coherent model for graphene formation to be devised.

KW - Graphene

KW - chemical vapor deposition (CVD)

KW - alloy catalyst

KW - in situ metrology

KW - XPS

KW - XRD

U2 - 10.1021/nl202036y

DO - 10.1021/nl202036y

M3 - Article

SN - 1530-6984

VL - 11

SP - 4154

EP - 4160

JO - Nano Letters

JF - Nano Letters

IS - 10

ER -

In Situ Characterization of Alloy Catalysts for Low-Temperature Graphene Growth

Abstract

Keywords

Access to Document

Fingerprint

Cite this