In situ monitoring of atmospheric pressure tin oxide CVD : Using near-infrared diode laser spectroscopy

R. J. Holdsworth, P. A. Martin, D. Raisbeck, M. E. Pemble

    Research output: Contribution to journalArticlepeer-review

    Abstract

    In situ near-IR diode laser absorption spectroscopy is a new technique which has been used to monitor reaction species involved in the atmospheric pressure tin oxide CVD deposition reaction. The system is entirely noninvasive and provides real-time analysis. Preliminary results obtained in the CVD deposition reaction of tin oxide onto a glass substrate in a small laboratory scale reactor is described. These will illustrate how sensitive the system is to small changes in reaction conditions which can then lead to much greater control over film qualities. Additionally, the light is easily transmitted through optical fibres to the reactor region to pass directly through the quartz reactor walls.
    Original languageEnglish
    Pages (from-to)-109-Pr8
    JournalJournal de Physique IV
    Volume9
    Issue number8
    Publication statusPublished - 1999

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