Initial stages of Cr and Ti growth on SiO2(0001)

S. P. Harte, A. P. Woodhead, S. Vinton, T. Evans, S. A. Haycock, C. A. Muryn, P. L. Wincott, V. R. Dhanak, C. E. Marsden, G. Thornton

    Research output: Contribution to journalArticlepeer-review

    Abstract

    The initial stages of titanium growth on the 1×1 and (√84×√84)R11° terminations and chromium growth on the (√84×√84)R11° termination of α-quartz SiO2 (0001) have been studied using polarization-dependent SEXAFS. Three metal coverages have been examined: nominally 0.25, 0.5 and 1.0 ML. The Ti K-edge results evidence reduction of the selvedge through the formation of a titanium oxide; with metallic Ti clusters formed at higher coverages. Ti-O distances of 1.96-2.00±0.03 angstroms are observed along with Ti-Ti distances of 2.89-2.92±0.03 angstroms. The former range is close to the Ti-O bond distances in rutile, whereas the latter is within the experimental error of that of bulk titanium. The Cr K-edge results are consistent with the formation of 15 atom clusters having an average nearest-neighbour Cr-Cr distance of 2.36±0.03 angstroms. This represents a contraction of about 6% from the bulk bcc lattice spacing. Such a contraction is consistent with the prediction of recent calculations.

    Original languageEnglish
    Pages (from-to)179-186
    Number of pages8
    JournalSurface Science
    Volume424
    Issue number2-3
    DOIs
    Publication statusPublished - 1 Apr 1999

    Keywords

    • Chromium growth
    • SEXAFS
    • SiO2
    • Titanium growth

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