Initial stages of Cr and Ti growth on SiO2(0001)

S. P. Harte; A. P. Woodhead; S. Vinton; T. Evans; S. A. Haycock; C. A. Muryn; P. L. Wincott; V. R. Dhanak; C. E. Marsden; G. Thornton

doi:10.1016/S0039-6028(98)00882-6

Initial stages of Cr and Ti growth on SiO₂(0001)

S. P. Harte^*, A. P. Woodhead, S. Vinton, T. Evans, S. A. Haycock, C. A. Muryn, P. L. Wincott, V. R. Dhanak, C. E. Marsden, G. Thornton

^*Corresponding author for this work

UMIST

Research output: Contribution to journal › Article › peer-review

Abstract

The initial stages of titanium growth on the 1×1 and (√84×√84)R11° terminations and chromium growth on the (√84×√84)R11° termination of α-quartz SiO₂ (0001) have been studied using polarization-dependent SEXAFS. Three metal coverages have been examined: nominally 0.25, 0.5 and 1.0 ML. The Ti K-edge results evidence reduction of the selvedge through the formation of a titanium oxide; with metallic Ti clusters formed at higher coverages. Ti-O distances of 1.96-2.00±0.03 angstroms are observed along with Ti-Ti distances of 2.89-2.92±0.03 angstroms. The former range is close to the Ti-O bond distances in rutile, whereas the latter is within the experimental error of that of bulk titanium. The Cr K-edge results are consistent with the formation of 15 atom clusters having an average nearest-neighbour Cr-Cr distance of 2.36±0.03 angstroms. This represents a contraction of about 6% from the bulk bcc lattice spacing. Such a contraction is consistent with the prediction of recent calculations.

Original language	English
Pages (from-to)	179-186
Number of pages	8
Journal	Surface Science
Volume	424
Issue number	2-3
DOIs	https://doi.org/10.1016/S0039-6028(98)00882-6
Publication status	Published - 1 Apr 1999

Keywords

Chromium growth
SEXAFS
SiO2
Titanium growth

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10.1016/S0039-6028(98)00882-6

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@article{c6dce19ba1a947568bb8bc564a8a3d9a,

title = "Initial stages of Cr and Ti growth on SiO2(0001)",

abstract = "The initial stages of titanium growth on the 1×1 and (√84×√84)R11° terminations and chromium growth on the (√84×√84)R11° termination of α-quartz SiO2 (0001) have been studied using polarization-dependent SEXAFS. Three metal coverages have been examined: nominally 0.25, 0.5 and 1.0 ML. The Ti K-edge results evidence reduction of the selvedge through the formation of a titanium oxide; with metallic Ti clusters formed at higher coverages. Ti-O distances of 1.96-2.00±0.03 angstroms are observed along with Ti-Ti distances of 2.89-2.92±0.03 angstroms. The former range is close to the Ti-O bond distances in rutile, whereas the latter is within the experimental error of that of bulk titanium. The Cr K-edge results are consistent with the formation of 15 atom clusters having an average nearest-neighbour Cr-Cr distance of 2.36±0.03 angstroms. This represents a contraction of about 6% from the bulk bcc lattice spacing. Such a contraction is consistent with the prediction of recent calculations.",

keywords = "Chromium growth, SEXAFS, SiO2, Titanium growth",

author = "Harte, {S. P.} and Woodhead, {A. P.} and S. Vinton and T. Evans and Haycock, {S. A.} and Muryn, {C. A.} and Wincott, {P. L.} and Dhanak, {V. R.} and Marsden, {C. E.} and G. Thornton",

year = "1999",

month = apr,

day = "1",

doi = "10.1016/S0039-6028(98)00882-6",

language = "English",

volume = "424",

pages = "179--186",

journal = "Surface Science",

issn = "0039-6028",

publisher = "Elsevier BV",

number = "2-3",

}

TY - JOUR

T1 - Initial stages of Cr and Ti growth on SiO2(0001)

AU - Harte, S. P.

AU - Woodhead, A. P.

AU - Vinton, S.

AU - Evans, T.

AU - Haycock, S. A.

AU - Muryn, C. A.

AU - Wincott, P. L.

AU - Dhanak, V. R.

AU - Marsden, C. E.

AU - Thornton, G.

PY - 1999/4/1

Y1 - 1999/4/1

N2 - The initial stages of titanium growth on the 1×1 and (√84×√84)R11° terminations and chromium growth on the (√84×√84)R11° termination of α-quartz SiO2 (0001) have been studied using polarization-dependent SEXAFS. Three metal coverages have been examined: nominally 0.25, 0.5 and 1.0 ML. The Ti K-edge results evidence reduction of the selvedge through the formation of a titanium oxide; with metallic Ti clusters formed at higher coverages. Ti-O distances of 1.96-2.00±0.03 angstroms are observed along with Ti-Ti distances of 2.89-2.92±0.03 angstroms. The former range is close to the Ti-O bond distances in rutile, whereas the latter is within the experimental error of that of bulk titanium. The Cr K-edge results are consistent with the formation of 15 atom clusters having an average nearest-neighbour Cr-Cr distance of 2.36±0.03 angstroms. This represents a contraction of about 6% from the bulk bcc lattice spacing. Such a contraction is consistent with the prediction of recent calculations.

AB - The initial stages of titanium growth on the 1×1 and (√84×√84)R11° terminations and chromium growth on the (√84×√84)R11° termination of α-quartz SiO2 (0001) have been studied using polarization-dependent SEXAFS. Three metal coverages have been examined: nominally 0.25, 0.5 and 1.0 ML. The Ti K-edge results evidence reduction of the selvedge through the formation of a titanium oxide; with metallic Ti clusters formed at higher coverages. Ti-O distances of 1.96-2.00±0.03 angstroms are observed along with Ti-Ti distances of 2.89-2.92±0.03 angstroms. The former range is close to the Ti-O bond distances in rutile, whereas the latter is within the experimental error of that of bulk titanium. The Cr K-edge results are consistent with the formation of 15 atom clusters having an average nearest-neighbour Cr-Cr distance of 2.36±0.03 angstroms. This represents a contraction of about 6% from the bulk bcc lattice spacing. Such a contraction is consistent with the prediction of recent calculations.

KW - Chromium growth

KW - SEXAFS

KW - SiO2

KW - Titanium growth

UR - http://www.scopus.com/inward/record.url?scp=0032674962&partnerID=8YFLogxK

U2 - 10.1016/S0039-6028(98)00882-6

DO - 10.1016/S0039-6028(98)00882-6

M3 - Article

AN - SCOPUS:0032674962

SN - 0039-6028

VL - 424

SP - 179

EP - 186

JO - Surface Science

JF - Surface Science

IS - 2-3

ER -

Initial stages of Cr and Ti growth on SiO₂(0001)

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Keywords

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