Interface Engineering Based on Multinanoscale Heterojunctions between NiO Quantum Dots, N-Doped Amorphous Carbon and Ni for Advanced Supercapacitor

B. Tong; W. Ye; C. Soutis; L. Mi

doi:10.1021/acsaem.0c02993

Interface Engineering Based on Multinanoscale Heterojunctions between NiO Quantum Dots, N-Doped Amorphous Carbon and Ni for Advanced Supercapacitor

B. Tong, W. Ye, C. Soutis, L. Mi

Materials Engineering

Research output: Contribution to journal › Article › peer-review

Original language	English
Journal	ACS Applied Energy Materials
DOIs	https://doi.org/10.1021/acsaem.0c02993
Publication status	Published - 2021

Access to Document

10.1021/acsaem.0c02993

Cite this

@article{681dc8cb62624390b429ffeeaba57969,

title = "Interface Engineering Based on Multinanoscale Heterojunctions between NiO Quantum Dots, N-Doped Amorphous Carbon and Ni for Advanced Supercapacitor",

author = "B. Tong and W. Ye and C. Soutis and L. Mi",

year = "2021",

doi = "10.1021/acsaem.0c02993",

language = "English",

journal = "ACS Applied Energy Materials",

issn = "2574-0962",

publisher = "American Chemical Society",

}

TY - JOUR

T1 - Interface Engineering Based on Multinanoscale Heterojunctions between NiO Quantum Dots, N-Doped Amorphous Carbon and Ni for Advanced Supercapacitor

AU - Tong, B.

AU - Ye, W.

AU - Soutis, C.

AU - Mi, L.

PY - 2021

Y1 - 2021

UR - http://www.scopus.com/inward/record.url?eid=2-s2.0-85103799088&partnerID=MN8TOARS

U2 - 10.1021/acsaem.0c02993

DO - 10.1021/acsaem.0c02993

M3 - Article

JO - ACS Applied Energy Materials

JF - ACS Applied Energy Materials

SN - 2574-0962

ER -

Interface Engineering Based on Multinanoscale Heterojunctions between NiO Quantum Dots, N-Doped Amorphous Carbon and Ni for Advanced Supercapacitor

Access to Document

Other files and links

Cite this