Original language | English |
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Pages (from-to) | 2086-2094 |
Journal | Journal of the Electrochemical Society |
Volume | 142 |
Publication status | Published - 1995 |
Kinetic and Transport Modelling of the Metalorganic Chemical Vapor Deposition of InP from Trimethyl-indium and Phosphine and Comparison with Experiments
C. Theodoropoulos, N.K. Ingle, T.J. Mountziaris, Z.-Y. Chen, P.L. Liu, G. Kioseoglou, A. Petrou
Research output: Contribution to journal › Article › peer-review