KINETICS OF LOW-PRESSURE MOCVD OF GAAS FROM TRIETHYL-GALLIUM AND ARSINE

N.K. Ingle, Constantinos Theodoropoulos, T. J. Mountziaris

    Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

    Original languageEnglish
    Title of host publicationGAS-PHASE AND SURFACE CHEMISTRY IN ELECTRONIC MATERIALS PROCESSING
    EditorsT J Mountziaris, G R PazPujalt, FT J Smith, P R Westmoreland
    PublisherMaterials Research Society
    Pages177-182
    Number of pages6
    Volume334
    ISBN (Print)1-55899-233-2
    Publication statusPublished - 1993
    EventSymposium on Gas-Phase and Surface Chemistry in Electronic Materials Processing, at the 1993 Fall Meeting of the Materials-Research-Society -
    Duration: 1 Jan 1824 → …

    Publication series

    NameMATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS

    Conference

    ConferenceSymposium on Gas-Phase and Surface Chemistry in Electronic Materials Processing, at the 1993 Fall Meeting of the Materials-Research-Society
    Period1/01/24 → …

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