Large area nanopatterning of silicon surface by chemical assisted laser processing using near-field enhancement by particle-lens arrays

Wei Guo, Zeng Bo Wang, Lin Li, Zhu Liu, Boris Luk'yanchuk, David J. Whitehead

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Nanopattering of silicon substrates using near-field enhancement by particle-lens arrays in a chemical solution is presented for the first time. Both experimental and theoretical investigations have been carried out to understand the properties of the nanopatterns produced. The obtained results proved that the developed nanofabrication technique is a flexible method for precise surface nanopatterning over large area surface. Novel nanostructures such as nano-bump and ring arrays, that previously not possible to be produed using the particle-lens arrays, have been demonstrated using this technique. A close-packed monolayer of SiO2 spheres (r= 250 nm) was directly formed onto the silicon surface by self-assembly, and a 248nm wavelength KrF excimer laser was used to irradiate the samples. The theoretical modeling of the optical near-field is based on extended Mie theory. The effect of the laser fluence and assisted chemicals is studied. Due to the focusing of the particle lens, a reaction between the chemical solution and substrate can be induced in the locally high energy region. As a result, a lower laser fluence than the ablation threshold of bulk silicon can be used to generate nano-scale features.

Original languageEnglish
Title of host publication3rd Pacific International Conference on Applications of Lasers and Optics, PICALO 2008 - Conference Proceedings
Pages895-898
Number of pages4
Publication statusPublished - 2008
Event3rd Pacific International Conference on Applications of Lasers and Optics, PICALO 2008 - Beijing, China
Duration: 16 Apr 200818 Apr 2008

Conference

Conference3rd Pacific International Conference on Applications of Lasers and Optics, PICALO 2008
Country/TerritoryChina
CityBeijing
Period16/04/0818/04/08

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