Localized near-band gap studies in nitrides via EELS.

  • A. Gutierrez-Sosa
  • , U. Bangert
  • , A. J. Harvey
  • , W. R. Flavell
  • , K. Jacobs
  • , I. Moermann
  • , A. Rizzi

    Research output: Contribution to journalArticlepeer-review

    Abstract

    EELS (PEELS) in the extreme-low loss energy range and Energy Loss Near Edge Spectroscopy (ELNES) were carried out in a cold FEG-STEM to study GaN(0001), AlGaN, and AlN. Using cross sectional samples, a study was performed of the variation of near-band gap states when stepping the e-beam parallel to the c direction along threading dislocations and in the perfect material. The aforementioned techniques, along with Energy Dispersive x-rays (EDX), were employed to study the substrate-thin film interface regions. Evidence was found of impurities gettering at dislocations and showed how this method can be used to measure small changes in near band-gap related energy values in a spatially resolved fashion. [on SciFinder (R)]
    Original languageEnglish
    JournalInstitute of Physics Conference Series
    Volume169
    Publication statusPublished - 2001

    Keywords

    • Band gap (EELS in nitrides localized near); Electron beams (energy loss; localized near-band gap studies in nitrides via)

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