Low-voltage, high-performance organic field-effect transistors with an ultra-thin TiO2 layer as gate insulator

Leszek Artur Majewski, Raoul Schroeder, Martin Grell

    Research output: Contribution to journalArticlepeer-review

    Abstract

    We report on our latest improvements in organic field-effect transistors (OFETs) using ultra-thin anodized gate insulators. Anodization of titanium (Ti) is an extremely cheap and simple technique to obtain high-quality, very thin (∼7.5 nm), pinhole-free, and robust gate insulators for OFETs. The anodized insulators have been tested in transistors using pentacene and poly(triarylamine) (PTAA) as active layers. The fabricated devices display low-threshold, normally "off" OFETs with negligible hysteresis good carrier mobility, high gate capacitance, and exceptionally low inverse subthreshold slope. Device performance is improved via chemical modification of TiO2 with an octadecyltrichlorosilane (OTS) self-assembled monolayer (SAM). As the result of this combination of favorable properties, we have demonstrated OFETs that can be operated with voltages well below 1 V. © 2005 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
    Original languageEnglish
    Pages (from-to)1017-1022
    Number of pages5
    JournalAdvanced Functional Materials
    Volume15
    Issue number6
    DOIs
    Publication statusPublished - Jun 2005

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