Megasonic agitation for enhanced electrodeposition of copper

Jens Kaufmann, Marc Desmulliez, Yingtao Tian, Dennis Price, Mike Hughes, Nadia Strusevich, Chris Bailey, Changqing Liu, David Hutt

    Research output: Contribution to journalArticlepeer-review

    Abstract

    Abstract In this paper we propose an agitation method based on megasonic acoustic streaming to overcome the limitations in plating rate and uniformity of the metal deposits during the electroplating process. Megasonic agitation at a frequency of 1 MHz allows the reduction of the thickness of the Nernst diffusion layer to less than 600 nm. Two applications that demonstrate the benefits of megasonic acoustic streaming are presented: the formation of uniform ultra-fine pitch flip-chip bumps and the metallisation of high aspect ratio microvias. For the latter application, a multi-physics based numerical simulation is implemented to describe the hydrodynamics introduced by the acoustic waves as they travel inside the deep microvias.
    Original languageEnglish
    Pages (from-to)1245-1254
    Number of pages10
    JournalMicrosystem Technologies
    Volume15
    Issue number8
    Publication statusPublished - 2009

    Fingerprint

    Dive into the research topics of 'Megasonic agitation for enhanced electrodeposition of copper'. Together they form a unique fingerprint.

    Cite this