Abstract
We report the effect of low-energy (1 keV) electron beam irradiation on gated, three-terminal devices constructed from metallic single-walled carbon nanotubes. Pristine devices, which exhibited negligible gate voltage response at room temperature and metallic single-electron transistor characteristics at low temperatures, when exposed to an electron beam, exhibited ambipolar field effect transistor (room temperature) and single-electron transistor (low temperature) characteristics. This metal-semiconductor transition is attributed to inhomogeneous electric fields arising from charging during electron irradiation. © 2005 American Chemical Society.
Original language | English |
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Pages (from-to) | 1575-1579 |
Number of pages | 4 |
Journal | Nano Letters |
Volume | 5 |
Issue number | 8 |
DOIs | |
Publication status | Published - Aug 2005 |
Keywords
- FIELD-EFFECT TRANSISTORS
- TRANSPORT
- DEVICES
- MEMORY
- ROPES