Modelling and simulation of low-frequency broadband LNA using InGaAs/InAlAs structures: A new approach

B. Boudjelida*, A. Sobih, A. Bouloukou, S. Boulay, S. Arshad, J. Sly, M. Missous

*Corresponding author for this work

    Research output: Contribution to journalArticlepeer-review

    Abstract

    The ultra-low leakage properties of a novel InGaAs/InAlAs/InP structure have been used to fabricate large gate periphery pHEMTs (up to 1200 μm2) required for wide band low-noise amplifiers (LNA). The devices were characterized and both linear and non-linear models were extracted. LNAs were then designed and compared favourably with the best results reported to date between 0.3 and 2 GHz, still using a 1 μm gate length optical lithography. Crown

    Original languageEnglish
    Pages (from-to)398-401
    Number of pages4
    JournalMaterials science in semiconductor processing
    Volume11
    Issue number5-6
    DOIs
    Publication statusPublished - 1 Oct 2008

    Keywords

    • InGaAs/InAlAs/InP
    • Low leakage
    • Low-noise amplifier
    • PHEMT
    • Radio astronomy
    • SKA

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