Abstract
The ultra-low leakage properties of a novel InGaAs/InAlAs/InP structure have been used to fabricate large gate periphery pHEMTs (up to 1200 μm2) required for wide band low-noise amplifiers (LNA). The devices were characterized and both linear and non-linear models were extracted. LNAs were then designed and compared favourably with the best results reported to date between 0.3 and 2 GHz, still using a 1 μm gate length optical lithography. Crown
Original language | English |
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Pages (from-to) | 398-401 |
Number of pages | 4 |
Journal | Materials science in semiconductor processing |
Volume | 11 |
Issue number | 5-6 |
DOIs | |
Publication status | Published - 1 Oct 2008 |
Keywords
- InGaAs/InAlAs/InP
- Low leakage
- Low-noise amplifier
- PHEMT
- Radio astronomy
- SKA