Modification of negative auto-photosensitive polyimide

Jiashen Li, J S Li, Z B Li, P K Zhu

Research output: Contribution to journalArticlepeer-review


This article describes the preparation of a kind of auto-photosensitive polyimide (PSPI) that contains organo-silicone moiety in its main chain. A group of novel auto-photosensitive polyimides were prepared based on the aromatic diamine monomers and 3,3',5,5'-benzophenontetracarboxylic dianhydride (BTDA) by the method of solution polycondensation at room temperature and imidized at a high temperature. The properties of PSPIs, such as ultraviolet (UV) absorption, electric and adhesion properties, and moisture absorption, were characterized by UV analysis, a dielectric constant detector, and so on. The relationship between the structure and properties of PSPIs is discussed. (C) 2000 John Wiley & Sons, Inc.
Original languageEnglish
Pages (from-to)943-947
Number of pages5
JournalJournal of Applied Polymer Science
Issue number4
Publication statusPublished - 2000


  • auto-photosensitive polyimide
  • polysiloxaneimide
  • polycondensation


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