Nanoscale electrical characterization of ultrathin high-k dielectric MOS stacks: A conducting AFM study

Extreme scaling in both silicon and alternative channel CMOS has highlighted the importance of localized characterization on the nanometer scale. We have used a conductive-contact atomic force microscopy (C-AFM) technique in ultra high vacuum (UHV) conditions to analyze and compare intrinsic stack degradation mechanisms leading to breakdown (BD) for ultrathin high-k dielectric films of (∼4 nm) HfxSiOy/SiO2 on Si and (∼2 nm) ZrO2/GeO2 on Ge. Simultaneous nanoscale current-voltage I-V characteristics, topography, tunneling current and relative tip-surface contact interactions as normal and lateral force maps revealed localized injected charge dependence on electrical stress. It is shown that the charge can propagate laterally. Successive voltage scanning is related to the overall post-BD conductivity for pre- to post-BD degradation propagation. In contrast with SiO2 interface, an increased GeO2 interlayer reactivity yielding more active interface defects is suggested. © 2008 Elsevier Ltd. All rights reserved.