Nanoscale perpendicular magnetic island arrays fabricated by extreme ultraviolet interference lithography

F. Luo, L. J. Heyderman, H. H. Solak, T. Thomson, M. E. Best

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    Abstract

    Magnetic island arrays with a period of 50 nm and uniform over 20×20 μ m2 have been fabricated by depositing CoPd multilayer films on prepatterned Si Ox pillars produced by extreme ultraviolet interference lithography. Scanning electron microscopy and magnetic force microscopy measurements made on the same islands give a direct, island-by-island comparison of the size and remanent switching field. The results demonstrate that the switching field distribution (SFD) is not primarily due to magnetostatic interactions, and a strong dependence of SFD on size is also not observed, indicating that a distribution of material properties is likely to be responsible for the SFD. © 2008 American Institute of Physics.
    Original languageEnglish
    Article number102505
    JournalApplied Physics Letters
    Volume92
    Issue number10
    DOIs
    Publication statusPublished - 2008

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