Nickel(II) complexes of N -(dialkylcarbamothioyl)-4-nitrobenzamide as single-source precursors for the deposition of nanostructured nickel sulfide thin films by chemical vapor deposition

Sohail Saeed, Naghmana Rashid, Mohammad Azad Malik, Paul Obrien, Wing Tak Wong

    Research output: Contribution to journalArticlepeer-review

    Abstract

    Nickel(II) complexes of N-(di-alkyl-carbamothioyl)-4-nitrobenzamide (alkyl = ethyl or n-propyl) have been synthesized and characterized by infrared spectroscopy, elemental analysis, nuclear magnetic resonance spectroscopy, and mass spectrometry. The structures of bis[N-(diethylcarbamothioyl)-4- nitrobenzamide]nickel(II) (2a) and bis[N-(dipropylcarbamothioyl)-4- nitrobenzamide]nickel(II) (2b) have been determined by X-ray crystallography. FTIR and NMR of the nickel complexes showed the absence of the N-H proton resonance and the N-H stretch and shift of ν C=O and ν C=S as expected. Both complexes have been used as single-source precursors for the deposition of nickel sulfide nanostructured thin films by aerosol-assisted chemical vapor deposition. The nanostructured thin films were characterized by X-ray powder diffraction, scanning electron microscopy, energy dispersive X-ray analysis, and atomic force microscopy.

    Original languageEnglish
    Pages (from-to)2788-2801
    Number of pages14
    JournalJournal of Coordination Chemistry
    Volume66
    Issue number16
    DOIs
    Publication statusPublished - 1 Aug 2013

    Keywords

    • AACVD
    • cis -Configuration
    • Crystal structure
    • Nickel complexes
    • SEM
    • Thin films

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