Nondestructive photolithography of conducting polymer structures

J. R. Chan, X. Q. Huang, A. M. Song

    Research output: Contribution to journalArticlepeer-review


    We have demonstrated a nondestructive method using ultraviolet (UV) photolithography to fabricate micrometer-sized conducting polymer structures. By coating a polymer film on patterned photoresist and then performing liftoff, UV exposure to the conducting polymer film was prevented throughout the lithography processes. We created features down to 1 μm with high yield. Such complementary metal-oxide-semiconductor-compatible microfabrication can be applied generally to various organic films, and may allow the speed of organic electronics to be improved. Organic thin-film transistors (OTFTs) were fabricated using poly(3-hexylthiophene) as the active material, and typical OTFT characteristics were obtained. © 2006 American Institute of Physics.
    Original languageEnglish
    Article number023710
    JournalJournal of Applied Physics
    Issue number2
    Publication statusPublished - 15 Jan 2006


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