On the origin of the 2.2-2.3 eV photoluminescence from chemically etched germanium

G. Kartopu*, S. C. Bayliss, V. A. Karavanskii, R. J. Curry, R. Turan, A. V. Sapelkin

*Corresponding author for this work

    Research output: Contribution to journalArticlepeer-review

    Abstract

    The photoluminescence (PL) at ∼2.2-2.3eV from Ge-based nanocrystalline materials is described in the literature as nanocrystal size-independent. We have observed visible luminescence from two different types of stain-etched Ge samples, one prepared after Sendova-Vassileva et al. (Thin Solid Films 255 (1995) 282) in a solution of H2O2:HF at 50:1 volume ratio, and the other in a solution of HF:H3PO4:H2O2 at 34:17:1 volume ratio. Energy dispersive X-ray analysis (EDX), Raman and FTIR spectroscopy, and the near edge X-ray absorption structure (XANES), indicate that the chemically etched Ge layers of the former type of samples are composed of non-stoichometric Ge oxides, i.e. GeOx (0<x<2), and free from any Ge nanoconstructions. It is also suggested from XANES that the latter type of chemically etched Ge samples comprise 8-9nm nanocrystals of Ge, surface-covered with mainly oxygen. Photoluminescence occurred at ∼2.3eV for all samples. The PL behavior of the latter type of chemically etched Ge on annealing in different chemical environments (air or H) allowed us to conclude that the PL from these materials, as well as that from those Ge-based nanocrystalline materials reported in the literature, is from GeOxs.

    Original languageEnglish
    Pages (from-to)275-283
    Number of pages9
    JournalJournal of Luminescence
    Volume101
    Issue number4
    DOIs
    Publication statusPublished - Apr 2003

    Keywords

    • Chemically etched Ge
    • Commercial c-GeO
    • Ge nanocrystals
    • GeO
    • Photoluminescence
    • XANES

    Fingerprint

    Dive into the research topics of 'On the origin of the 2.2-2.3 eV photoluminescence from chemically etched germanium'. Together they form a unique fingerprint.

    Cite this