Abstract
The anodization of Ti to obtain high-quality, ultra-thin gate insulators for organic field-effect transistors (OFET), was analyzed. An anodized-TiO 2 surface was capped with an ultrathin layer of poly(α-methylstyrene) (PAMS) spun from dilute solution. It was observed that the anodization voltage of 5 V corresponded to an ultra-thin layer of the oxide with a thickness in the region of 7-8 nm. The gate leakage was revealed by an apparent positive drain current at zero drain voltage, but non-zero gate voltage. The results show that the PAMS-capped TiO2 device displays tenfold lower leakage than an uncapped TiO2 OFET with similar semiconductor/insulator overlap.
Original language | English |
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Pages (from-to) | 192-196 |
Number of pages | 4 |
Journal | Advanced Materials |
Volume | 17 |
Issue number | 2 |
DOIs | |
Publication status | Published - 31 Jan 2005 |