Optical properties of carbon films deposited using a hybrid physical vapour deposition technique

A. Dehbi-Alaoui; P. Holiday; A. Matthews

doi:10.1016/0257-8972(91)90298-B

Optical properties of carbon films deposited using a hybrid physical vapour deposition technique

A. Dehbi-Alaoui, P. Holiday, A. Matthews

Materials Engineering

The University of Hull

Research output: Contribution to journal › Article › peer-review

Abstract

The optical properties of carbon films grown by evaporation of graphite in butane and argon d.c. or low-frequency r.f. plasmas are studied. The characteristics are found to be highly dependent on the substrate material (glass or tool steel) and are also related to process conditions, such as bias voltage and hydrogen-to-carbon ratio in the plasma.

Original language	English
Pages (from-to)	327-335
Number of pages	9
Journal	Surface and Coatings Technology
Volume	47
Issue number	1-3
DOIs	https://doi.org/10.1016/0257-8972(91)90298-B
Publication status	Published - 1 Jan 1991

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title = "Optical properties of carbon films deposited using a hybrid physical vapour deposition technique",

abstract = "The optical properties of carbon films grown by evaporation of graphite in butane and argon d.c. or low-frequency r.f. plasmas are studied. The characteristics are found to be highly dependent on the substrate material (glass or tool steel) and are also related to process conditions, such as bias voltage and hydrogen-to-carbon ratio in the plasma.",

author = "A. Dehbi-Alaoui and P. Holiday and A. Matthews",

year = "1991",

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AU - Dehbi-Alaoui, A.

AU - Holiday, P.

AU - Matthews, A.

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Y1 - 1991/1/1

N2 - The optical properties of carbon films grown by evaporation of graphite in butane and argon d.c. or low-frequency r.f. plasmas are studied. The characteristics are found to be highly dependent on the substrate material (glass or tool steel) and are also related to process conditions, such as bias voltage and hydrogen-to-carbon ratio in the plasma.

AB - The optical properties of carbon films grown by evaporation of graphite in butane and argon d.c. or low-frequency r.f. plasmas are studied. The characteristics are found to be highly dependent on the substrate material (glass or tool steel) and are also related to process conditions, such as bias voltage and hydrogen-to-carbon ratio in the plasma.

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AN - SCOPUS:0026203540

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SP - 327

EP - 335

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

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ER -

Optical properties of carbon films deposited using a hybrid physical vapour deposition technique

Abstract

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