Origin of compressive strain and phase transition characteristics of thin BaTiO3 film grown on LaNiO3/Si substrate

L Qiao, X F Bi

    Research output: Contribution to journalArticlepeer-review

    Abstract

    BaTiO3 (BTO) thin films of 100 nm were grown on Si substrates buffered with LaNiO3 (LNO) layers with various thicknesses. X-ray diffraction and strain analysis demonstrate that the BTO film grown on the LNO of 600 nm is in an in-plane compressive strain state. The remnant polarization of 10.2 mu C/cm(2) obtained for the film also indicates the presence of the compressive strain state. However, dielectric measurement reveals a phase transition temperature of 100 degrees C, lower than the typical value of 120 degrees C. The result is discussed in terms of the stiffening of soft mode in the center of Brillouin zone. The corresponding domain configuration is also investigated. (C) 2010 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
    Original languageEnglish
    Pages (from-to)2511-2516
    Number of pages6
    JournalPhysica Status Solidi a-Applications and Materials Science
    Volume207
    Issue number11
    DOIs
    Publication statusPublished - 2010

    Keywords

    • BaTiO3
    • ferroelectrics
    • LaNiO3
    • strain
    • phase transitions
    • thin films
    • PULSED-LASER DEPOSITION
    • FERROELECTRIC PROPERTIES
    • DIELECTRIC-PROPERTIES
    • DOMAIN FORMATION
    • BUFFER LAYERS
    • SI
    • HETEROSTRUCTURES
    • CAPACITORS
    • THICKNESS
    • SI(001)

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