Origin of the photon induced Cl+ yield from Si(111)7 × 7-Cl at the Cl and Si K-edges

D. Purdie; C. A. Muryn; N. S. Prakash; P. L. Wincott; G. Thornton; D. S.L. Law

doi:10.1016/0039-6028(91)91052-Y

Origin of the photon induced Cl⁺ yield from Si(111)7 × 7-Cl at the Cl and Si K-edges

D. Purdie^*, C. A. Muryn, N. S. Prakash, P. L. Wincott, G. Thornton, D. S.L. Law

^*Corresponding author for this work

School of Engineering - Administration (L5)

UMIST

Research output: Contribution to journal › Article › peer-review

Abstract

The yield of Cl⁺ ions from Si(111)7 × 7-Cl has been monitored through both the Cl and Si K-edges. The Cl K-edge ion yield EXAFS suggests a majority site origin, the data producing the same result as Auger yield SEXAFS: an atop geometry with a Cl-Si bond length of 2.00 ± 0.02 Å. The Cl⁺-yield data recorded at the Si K-edge are identical to bulk Si EXAFS and the desorption mechanism at this edge is concluded to be X-ray induced electron stimulated desorption (XESD).

Original language	English
Pages (from-to)	546-550
Number of pages	5
Journal	Surface Science
Volume	251-252
Issue number	C
DOIs	https://doi.org/10.1016/0039-6028(91)91052-Y
Publication status	Published - 1 Jul 1991

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@article{c1823dc44f1e47668ce8ffd9ceaf1cea,

title = "Origin of the photon induced Cl+ yield from Si(111)7 × 7-Cl at the Cl and Si K-edges",

abstract = "The yield of Cl+ ions from Si(111)7 × 7-Cl has been monitored through both the Cl and Si K-edges. The Cl K-edge ion yield EXAFS suggests a majority site origin, the data producing the same result as Auger yield SEXAFS: an atop geometry with a Cl-Si bond length of 2.00 ± 0.02 {\AA}. The Cl+-yield data recorded at the Si K-edge are identical to bulk Si EXAFS and the desorption mechanism at this edge is concluded to be X-ray induced electron stimulated desorption (XESD).",

author = "D. Purdie and Muryn, {C. A.} and Prakash, {N. S.} and Wincott, {P. L.} and G. Thornton and Law, {D. S.L.}",

note = "Funding Information: This work was supported by the UK Science and Engineering Research Council with additional support from Johnson Matthey plc.",

year = "1991",

month = jul,

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doi = "10.1016/0039-6028(91)91052-Y",

language = "English",

volume = "251-252",

pages = "546--550",

journal = "Surface Science",

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publisher = "Elsevier BV",

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TY - JOUR

T1 - Origin of the photon induced Cl+ yield from Si(111)7 × 7-Cl at the Cl and Si K-edges

AU - Purdie, D.

AU - Muryn, C. A.

AU - Prakash, N. S.

AU - Wincott, P. L.

AU - Thornton, G.

AU - Law, D. S.L.

N1 - Funding Information: This work was supported by the UK Science and Engineering Research Council with additional support from Johnson Matthey plc.

PY - 1991/7/1

Y1 - 1991/7/1

N2 - The yield of Cl+ ions from Si(111)7 × 7-Cl has been monitored through both the Cl and Si K-edges. The Cl K-edge ion yield EXAFS suggests a majority site origin, the data producing the same result as Auger yield SEXAFS: an atop geometry with a Cl-Si bond length of 2.00 ± 0.02 Å. The Cl+-yield data recorded at the Si K-edge are identical to bulk Si EXAFS and the desorption mechanism at this edge is concluded to be X-ray induced electron stimulated desorption (XESD).

AB - The yield of Cl+ ions from Si(111)7 × 7-Cl has been monitored through both the Cl and Si K-edges. The Cl K-edge ion yield EXAFS suggests a majority site origin, the data producing the same result as Auger yield SEXAFS: an atop geometry with a Cl-Si bond length of 2.00 ± 0.02 Å. The Cl+-yield data recorded at the Si K-edge are identical to bulk Si EXAFS and the desorption mechanism at this edge is concluded to be X-ray induced electron stimulated desorption (XESD).

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U2 - 10.1016/0039-6028(91)91052-Y

DO - 10.1016/0039-6028(91)91052-Y

M3 - Article

AN - SCOPUS:17444436072

SN - 0039-6028

VL - 251-252

SP - 546

EP - 550

JO - Surface Science

JF - Surface Science

IS - C

ER -

Origin of the photon induced Cl⁺ yield from Si(111)7 × 7-Cl at the Cl and Si K-edges

Abstract

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