Oxidation Behaviour of Nanoscale Multilayer CrAlYN/CrN Coatings Deposited by the Combined High Power Impulse Magnetron Sputtering/Unbalanced Magnetron Sputtering Technique

C Reinhard; AP Ehiasarian; PE Hovsepian

doi:10.1002/ppap.200732204

Oxidation Behaviour of Nanoscale Multilayer CrAlYN/CrN Coatings Deposited by the Combined High Power Impulse Magnetron Sputtering/Unbalanced Magnetron Sputtering Technique

C Reinhard, AP Ehiasarian, PE Hovsepian

FSE Faculty Office - general

Research output: Contribution to journal › Article › peer-review

Abstract

A 5 µm thick nanoscale multilayer CrAlYN/CrN coating was produced by high power impulse magnetron sputtering (HIPIMS) substrate pretreatment and subsequent coating deposition by unbalanced magnetron sputtering. HIPIMS pretreatment resulted in high adhesion due to local epitaxial growth on large substrate surface areas. Isothermal heat-treatment for 1 h at various temperatures up to 1 000 °C was carried out, X-ray analysis and cross-sectional transmission electron microscopy revealed a coating structure stable up to 900 °C. Above 900 °C, the thin film decomposed into Cr₂N and hcp-AlN, resulting in stress relaxation and reduced hardness, a dense and protective duplex-oxide with an Al-rich outer and a Cr-rich inner oxide layer formed at 1 000 °C.

Original language	English
Pages (from-to)	S910-S915
Number of pages	6
Journal	Plasma Processes and Polymers
Volume	4
DOIs	https://doi.org/10.1002/ppap.200732204
Publication status	Published - Apr 2007

Keywords

Films
Heat-treatment
Nanolayers
Plasma etching
Transmission electron microscopy

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10.1002/ppap.200732204

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title = "Oxidation Behaviour of Nanoscale Multilayer CrAlYN/CrN Coatings Deposited by the Combined High Power Impulse Magnetron Sputtering/Unbalanced Magnetron Sputtering Technique",

abstract = "A 5 µm thick nanoscale multilayer CrAlYN/CrN coating was produced by high power impulse magnetron sputtering (HIPIMS) substrate pretreatment and subsequent coating deposition by unbalanced magnetron sputtering. HIPIMS pretreatment resulted in high adhesion due to local epitaxial growth on large substrate surface areas. Isothermal heat-treatment for 1 h at various temperatures up to 1 000 °C was carried out, X-ray analysis and cross-sectional transmission electron microscopy revealed a coating structure stable up to 900 °C. Above 900 °C, the thin film decomposed into Cr2N and hcp-AlN, resulting in stress relaxation and reduced hardness, a dense and protective duplex-oxide with an Al-rich outer and a Cr-rich inner oxide layer formed at 1 000 °C.",

keywords = "Films, Heat-treatment, Nanolayers, Plasma etching, Transmission electron microscopy",

author = "C Reinhard and AP Ehiasarian and PE Hovsepian",

year = "2007",

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doi = "10.1002/ppap.200732204",

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T1 - Oxidation Behaviour of Nanoscale Multilayer CrAlYN/CrN Coatings Deposited by the Combined High Power Impulse Magnetron Sputtering/Unbalanced Magnetron Sputtering Technique

AU - Reinhard, C

AU - Ehiasarian, AP

AU - Hovsepian, PE

PY - 2007/4

Y1 - 2007/4

N2 - A 5 µm thick nanoscale multilayer CrAlYN/CrN coating was produced by high power impulse magnetron sputtering (HIPIMS) substrate pretreatment and subsequent coating deposition by unbalanced magnetron sputtering. HIPIMS pretreatment resulted in high adhesion due to local epitaxial growth on large substrate surface areas. Isothermal heat-treatment for 1 h at various temperatures up to 1 000 °C was carried out, X-ray analysis and cross-sectional transmission electron microscopy revealed a coating structure stable up to 900 °C. Above 900 °C, the thin film decomposed into Cr2N and hcp-AlN, resulting in stress relaxation and reduced hardness, a dense and protective duplex-oxide with an Al-rich outer and a Cr-rich inner oxide layer formed at 1 000 °C.

AB - A 5 µm thick nanoscale multilayer CrAlYN/CrN coating was produced by high power impulse magnetron sputtering (HIPIMS) substrate pretreatment and subsequent coating deposition by unbalanced magnetron sputtering. HIPIMS pretreatment resulted in high adhesion due to local epitaxial growth on large substrate surface areas. Isothermal heat-treatment for 1 h at various temperatures up to 1 000 °C was carried out, X-ray analysis and cross-sectional transmission electron microscopy revealed a coating structure stable up to 900 °C. Above 900 °C, the thin film decomposed into Cr2N and hcp-AlN, resulting in stress relaxation and reduced hardness, a dense and protective duplex-oxide with an Al-rich outer and a Cr-rich inner oxide layer formed at 1 000 °C.

KW - Films

KW - Heat-treatment

KW - Nanolayers

KW - Plasma etching

KW - Transmission electron microscopy

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DO - 10.1002/ppap.200732204

M3 - Article

SN - 1612-8850

VL - 4

SP - S910-S915

JO - Plasma Processes and Polymers

JF - Plasma Processes and Polymers

ER -

Oxidation Behaviour of Nanoscale Multilayer CrAlYN/CrN Coatings Deposited by the Combined High Power Impulse Magnetron Sputtering/Unbalanced Magnetron Sputtering Technique

Abstract

Keywords

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