Porous tantala and alumina films from non-thickness limited anodising in phosphate/glycerol electrolyte

Q. Lu; G. Alcalá; P. Skeldon; G. E. Thompson; M. J. Graham; D. Masheder; K. Shimizu; H. Habazaki

doi:10.1016/S0013-4686(02)00545-5

Porous tantala and alumina films from non-thickness limited anodising in phosphate/glycerol electrolyte

Q. Lu, G. Alcalá, P. Skeldon, G. E. Thompson, M. J. Graham, D. Masheder, K. Shimizu, H. Habazaki

Research output: Contribution to journal › Article › peer-review

Abstract

The present study demonstrates that the phenomenon of non-thickness limited (NTL) growth of anodic films in a phosphate/glycerol electrolyte at 453 K on tantalum and aluminium is due to the formation of porous films. For both tantala and alumina films, the resultant morphology comprises cells of material orientated approximately normal to the metal/film interface, with each cell containing a central pore of typical diameter in the range 3-15 nm and a barrier layer of film material at the base of the pore. The total porosity is about 5%. The hardness of NTL tantala films, determined by nanoindentation, was 5.1 GPa, reasonably similar to that of conventional anodic tantala. © 2002 Elsevier Science Ltd. All rights reserved.

Original language	English
Pages (from-to)	37-42
Number of pages	5
Journal	Electrochimica Acta
Volume	48
Issue number	1
DOIs	https://doi.org/10.1016/S0013-4686(02)00545-5
Publication status	Published - 4 Nov 2002

Keywords

Aluminium
Anodising
Porous film
Tantalum

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@article{abf6ac994fa34bdf887c8a178781ee8c,

title = "Porous tantala and alumina films from non-thickness limited anodising in phosphate/glycerol electrolyte",

abstract = "The present study demonstrates that the phenomenon of non-thickness limited (NTL) growth of anodic films in a phosphate/glycerol electrolyte at 453 K on tantalum and aluminium is due to the formation of porous films. For both tantala and alumina films, the resultant morphology comprises cells of material orientated approximately normal to the metal/film interface, with each cell containing a central pore of typical diameter in the range 3-15 nm and a barrier layer of film material at the base of the pore. The total porosity is about 5%. The hardness of NTL tantala films, determined by nanoindentation, was 5.1 GPa, reasonably similar to that of conventional anodic tantala. {\textcopyright} 2002 Elsevier Science Ltd. All rights reserved.",

keywords = "Aluminium, Anodising, Porous film, Tantalum",

author = "Q. Lu and G. Alcal{\'a} and P. Skeldon and Thompson, {G. E.} and Graham, {M. J.} and D. Masheder and K. Shimizu and H. Habazaki",

year = "2002",

month = nov,

day = "4",

doi = "10.1016/S0013-4686(02)00545-5",

language = "English",

volume = "48",

pages = "37--42",

journal = "Electrochimica Acta",

publisher = "Elsevier BV",

number = "1",

}

TY - JOUR

T1 - Porous tantala and alumina films from non-thickness limited anodising in phosphate/glycerol electrolyte

AU - Lu, Q.

AU - Alcalá, G.

AU - Skeldon, P.

AU - Thompson, G. E.

AU - Graham, M. J.

AU - Masheder, D.

AU - Shimizu, K.

AU - Habazaki, H.

PY - 2002/11/4

Y1 - 2002/11/4

N2 - The present study demonstrates that the phenomenon of non-thickness limited (NTL) growth of anodic films in a phosphate/glycerol electrolyte at 453 K on tantalum and aluminium is due to the formation of porous films. For both tantala and alumina films, the resultant morphology comprises cells of material orientated approximately normal to the metal/film interface, with each cell containing a central pore of typical diameter in the range 3-15 nm and a barrier layer of film material at the base of the pore. The total porosity is about 5%. The hardness of NTL tantala films, determined by nanoindentation, was 5.1 GPa, reasonably similar to that of conventional anodic tantala. © 2002 Elsevier Science Ltd. All rights reserved.

AB - The present study demonstrates that the phenomenon of non-thickness limited (NTL) growth of anodic films in a phosphate/glycerol electrolyte at 453 K on tantalum and aluminium is due to the formation of porous films. For both tantala and alumina films, the resultant morphology comprises cells of material orientated approximately normal to the metal/film interface, with each cell containing a central pore of typical diameter in the range 3-15 nm and a barrier layer of film material at the base of the pore. The total porosity is about 5%. The hardness of NTL tantala films, determined by nanoindentation, was 5.1 GPa, reasonably similar to that of conventional anodic tantala. © 2002 Elsevier Science Ltd. All rights reserved.

KW - Aluminium

KW - Anodising

KW - Porous film

KW - Tantalum

U2 - 10.1016/S0013-4686(02)00545-5

DO - 10.1016/S0013-4686(02)00545-5

M3 - Article

VL - 48

SP - 37

EP - 42

JO - Electrochimica Acta

JF - Electrochimica Acta

IS - 1

ER -

Porous tantala and alumina films from non-thickness limited anodising in phosphate/glycerol electrolyte

Abstract

Keywords

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