Precise control of interface anisotropy during deposition of Co/Pd multilayers

C. W. Barton, T. J A Slater, R. M. Rowan-Robinson, S. J. Haigh, D. Atkinson, T. Thomson

    Research output: Contribution to journalArticlepeer-review


    We demonstrate the control of perpendicular magnetic anisotropy (PMA) in multilayer films without modification of either the microstructure or saturation magnetization by tuning the Ar+ ion energy using remote plasma sputtering. We show that for [Co/Pd]8 multilayer films, increasing the Ar+ ion energy results in a strong decrease in PMA through an increase in interfacial roughness determined by X-ray reflectivity measurements. X-ray diffraction and transmission electron microscope image data show that the microstructure is independent of Ar+ energy. This opens a different approach to the in-situ deposition of graded exchange springs and for control of the polarizing layer in hybrid spin transfer torque devices.

    Original languageEnglish
    Article number203903
    JournalJournal of Applied Physics
    Issue number20
    Publication statusPublished - 28 Nov 2014


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