Proceedings of 2012 IEEE 2nd International Workshop on Requirements Patterns (RePa)

L. Chung, B. Paech, L. Zhao, L. Liu, S. Supakkul

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    Abstract

    Getting requirements right is critical to the success of just about any software development project, and yet oftentimes challenging and in need of a large amount of knowledge and experience. “Patterns” have been used to capture knowledge of software engineering, concerning software architectures, component designs and programs, and more recently requirements too. This workshop is the second edition of the International Workshop on Requirements Patterns (RePa) that provides an open forum for researchers and practitioners to exchange ideas and experience, regarding pattern-based approaches to capturing, organizing, and reusing of all aspects of requirements engineeringrelated knowledge, from both product and process perspectives.
    Original languageEnglish
    Title of host publicationInternational Workshop on Requirements Patterns
    Place of PublicationU.S.A.
    PublisherIEEE
    Number of pages54
    Volume1
    Publication statusPublished - 24 Sept 2012
    EventIEEE International Conference on Requirements Engineering (RE 2012) - Chicago
    Duration: 24 Sept 201228 Sept 2012

    Publication series

    NameInternational Workshop on Requirements Patterns
    PublisherIEEE

    Conference

    ConferenceIEEE International Conference on Requirements Engineering (RE 2012)
    CityChicago
    Period24/09/1228/09/12

    Fingerprint

    Dive into the research topics of 'Proceedings of 2012 IEEE 2nd International Workshop on Requirements Patterns (RePa)'. Together they form a unique fingerprint.

    Cite this