Process effects in ion plating

K. S. Fancey; A. Matthews

doi:10.1016/0042-207X(90)94223-D

Process effects in ion plating

K. S. Fancey^*, A. Matthews

^*Corresponding author for this work

Materials Engineering

The University of Hull

Research output: Contribution to journal › Article › peer-review

Abstract

By the use of Optical Emission Spectroscopy and cathode sheath thickness measurements in ion plating discharges, we have (i) identified the influence of ionisation intensification sources on plasma spatial distribution, (ii) shown that nitrogen dissociative charge exchange in the sheath may be significant under certain conditions, and (iii) found evidence for the possible presence of metal clusters in the discharge. The implications of these findings are discussed.

Original language	English
Pages (from-to)	2196-2200
Number of pages	5
Journal	Vacuum
Volume	41
Issue number	7-9
DOIs	https://doi.org/10.1016/0042-207X(90)94223-D
Publication status	Published - 1 Jan 1990

Keywords

Glow Discharges--Effects
Plasmas--Production
Spectroscopy, Emission--Applications
Titanium and Alloys--Vapor Deposition
Cathode Sheath Thickness Measurements
Ion Plating Discharges
Optical Emission Spectroscopy
Plasma-Assisted Vapor Deposition

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10.1016/0042-207X(90)94223-D

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title = "Process effects in ion plating",

abstract = "By the use of Optical Emission Spectroscopy and cathode sheath thickness measurements in ion plating discharges, we have (i) identified the influence of ionisation intensification sources on plasma spatial distribution, (ii) shown that nitrogen dissociative charge exchange in the sheath may be significant under certain conditions, and (iii) found evidence for the possible presence of metal clusters in the discharge. The implications of these findings are discussed.",

keywords = "Glow Discharges--Effects, Plasmas--Production, Spectroscopy, Emission--Applications, Titanium and Alloys--Vapor Deposition, Cathode Sheath Thickness Measurements, Ion Plating Discharges, Optical Emission Spectroscopy, Plasma-Assisted Vapor Deposition",

author = "Fancey, \{K. S.\} and A. Matthews",

year = "1990",

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doi = "10.1016/0042-207X(90)94223-D",

language = "English",

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journal = "Vacuum",

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T1 - Process effects in ion plating

AU - Fancey, K. S.

AU - Matthews, A.

PY - 1990/1/1

Y1 - 1990/1/1

N2 - By the use of Optical Emission Spectroscopy and cathode sheath thickness measurements in ion plating discharges, we have (i) identified the influence of ionisation intensification sources on plasma spatial distribution, (ii) shown that nitrogen dissociative charge exchange in the sheath may be significant under certain conditions, and (iii) found evidence for the possible presence of metal clusters in the discharge. The implications of these findings are discussed.

AB - By the use of Optical Emission Spectroscopy and cathode sheath thickness measurements in ion plating discharges, we have (i) identified the influence of ionisation intensification sources on plasma spatial distribution, (ii) shown that nitrogen dissociative charge exchange in the sheath may be significant under certain conditions, and (iii) found evidence for the possible presence of metal clusters in the discharge. The implications of these findings are discussed.

KW - Glow Discharges--Effects

KW - Plasmas--Production

KW - Spectroscopy, Emission--Applications

KW - Titanium and Alloys--Vapor Deposition

KW - Cathode Sheath Thickness Measurements

KW - Ion Plating Discharges

KW - Optical Emission Spectroscopy

KW - Plasma-Assisted Vapor Deposition

UR - http://www.scopus.com/inward/record.url?scp=0025658887&partnerID=8YFLogxK

U2 - 10.1016/0042-207X(90)94223-D

DO - 10.1016/0042-207X(90)94223-D

M3 - Article

AN - SCOPUS:0025658887

SN - 0042-207X

VL - 41

SP - 2196

EP - 2200

JO - Vacuum

JF - Vacuum

IS - 7-9

ER -

Process effects in ion plating

Abstract

Keywords

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