Process-induced positive charges in Hf-based gate stacks

C. Z. Zhao*, J. F. Zhang, M. H. Chang, A. R. Peaker, S. Hall, G. Groeseneken, L. Pantisano, S. De Gendt, M. Heyns

*Corresponding author for this work

    Research output: Contribution to journal › Article › peer-review

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