Pseudo-intramolecular behaviour of near-edge X-ray absorption fine structure from an atomic adsorbate

D. Purdie, C. A. Muryn, N. S. Prakash, K. G. Purcell, P. L. Wincott, G. Thornton, D. S. -L.law

Research output: Contribution to journalArticlepeer-review

Abstract

The polarization dependence of the Cl K-edge 'white-line' has been measured from Si(111)7*7-Cl and Si(100)2*1-Cl. In both cases it has the form expected on the basis of a pseudo-intramolecular sigma *- resonance model. This suggests that the near-edge X-ray absorption fine structure (NEXAFS) could provide a simple, incisive monitor of the surface structure for atomic adsorbates on semiconductors. Together with the corresponding surface extended X-ray adsorption fine structure (SEXAFS), the Si(100)2*1-Cl NEXAFS indicates that Cl bonds atop a buckled dimer with a Cl-Si bond length of 2.00+or-0.02 AA.

Original languageEnglish
Article number020
Pages (from-to)7751-7755
Number of pages5
JournalJournal of Physics: Condensed Matter
Volume3
Issue number39
DOIs
Publication statusPublished - 1991

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