TY - JOUR
T1 - Quantification of grain boundary equilibrium segregation by NanoSIMS analysis of bulk samples
AU - Christien, F
AU - Downing, C
AU - Moore, K L
AU - Grovenor, C R M
N1 - Cited By :4 Export Date: 26 January 2015 CODEN: SIAND Correspondence Address: Christien, F.; LUNAM Université, Université de Nantes, polytech'Nantes, Laboratoire Génie des Matériaux et Procédés Associés, Rue Christian Pauc, 44306 Nantes Cedex 3, France; email: [email protected] References: Larère, A., Guttmann, M., Dumoulin, P., Roques-Carmes, C., (1982) Acta Metall., 30, p. 685; Ben Mostepha, L., Saindrenan, G., Barbouth, N., Brass, A.M., Chêne, J., (1990) Scripta Metall. Mater., 24, p. 773; Seah, M.P., (1990) Auger and X-ray Photoelectron Spectroscopy, 1. , Wiley, New York; Lejcek, P., (2010) Grain Boundary Segregation in Metals, , in, Springer, Berlin, Heidelberg; Karlsson, L., Norden, H., Odelius, H., (1988) Acta Metall., 36, p. 1; Gavrilov, K.L., Bennison, S.J., Mikeska, K.R., Levi-Setti, R., (1999) Acta Mater., 47, p. 4031; McIntyre, N.S., Huctwith, C.M., Taylor, K.F., Keating, E., Petersen, N.O., Brennenstühl, A.M., (2002) Surf. Interface Anal., 33, p. 447; Dark, C., Kilburn, M.R., Hammer, G., Schneider, C., Mannhart, J., Grovenor, C.R.M., (2006) J. Phys.: Conference Series, 43, p. 272; Lozano-Perez, S., Schröder, M., Yamada, T., Terachi, T., English, C.A., Grovenor, C.R.M., (2008) Appl. Surf. Sci., 255, p. 1541; Valle, N., Drillet, J., Pic, A., Migeon, H.N., (2011) Surf. Interface Anal., 43, p. 573; Nowakowski, P., Christien, F., Allart, M., Borjon-Piron, Y., Le Gall, R., (2011) Surf. Sci., 605, p. 848; McLean, D., (1957) Grain Boundaries in Metals, , Clarendon Press, Oxford; Guttmann, M., (1975) Surf. Sci., 53, p. 213; Hondros, E.D., Seah, M.P., (1977) Int. Met. Rev., 22, p. 262; Du Plessis, J., Van Wyk, G.N., (1988) J. Phys. Chem. Solids, 49, p. 1441; Faulkner, R.G., (1996) Int. Mater. Rev., 41, p. 197; Hondros, E.D., Seah, M.P., Hofmann, S., Lejcek, P., (1996) Physical Metallurgy, pp. 1201-1289. , in (4th edn), (Eds: R. W. Cahn, P. Haasen), North-Holland, Amsterdam; Vladimirov, A.B., Kaigorodov, V.N., Klotzman, S.M., Trakhtenberg, I.S., (1975) Fizika Metallov i Metallovedenie, 39, p. 319; Lejcek, P., Hofmann, S., (1995) Critical Reviews in Solid State and Materials Sciences, 20, p. 1; Lejcek, P., Rar, A., Hofmann, S., (2002) Surf. Interface Anal., 34, p. 375
PY - 2012
Y1 - 2012
N2 - A technique for the quantification of equilibrium grain boundary segregation by high resolution secondary ion mass spectroscopy (NanoSIMS) on simple metallographically polished surfaces has been demonstrated for the model system of sulphur segregation to nickel grain boundaries. Samples of nickel containing 5.4 wt ppm of sulphur were annealed at different temperatures to achieve different equilibrium sulphur grain boundary concentrations, ranging from less than 1% to about 50% of a monolayer. Quantification was carried out from sulphur concentration profiles acquired across about 20 grain boundaries in each sample. An internal standard (nickel containing a known concentration of sulphur in solid solution) was used for calibration. It is found that, depending on the annealing temperature, the average grain boundary sulphur concentration ranges from 0.9 to 25.8 ng cm -2 (or 1.7 10 13 to 4.8 10 14 atoms cm -2), i.e. ∼0.015 to ∼0.43 monolayer. Thermodynamic analysis gives a segregation free energy of -97.8 kJ mol -1 and a grain boundary sulphur concentration at saturation of 26.7 ng cm -2 (or 5.0×10 14 atoms cm -2), i.e. ∼0.44 monolayer, in good agreement with previous measurements on this system. The limit of detection of the technique is shown to be as low as 0.24 ng cm -2 (or 4.5×10 12 atoms cm -2), i.e. ∼0.004 monolayer, with a counting time of only 10 min. © 2012 John Wiley & Sons, Ltd.
AB - A technique for the quantification of equilibrium grain boundary segregation by high resolution secondary ion mass spectroscopy (NanoSIMS) on simple metallographically polished surfaces has been demonstrated for the model system of sulphur segregation to nickel grain boundaries. Samples of nickel containing 5.4 wt ppm of sulphur were annealed at different temperatures to achieve different equilibrium sulphur grain boundary concentrations, ranging from less than 1% to about 50% of a monolayer. Quantification was carried out from sulphur concentration profiles acquired across about 20 grain boundaries in each sample. An internal standard (nickel containing a known concentration of sulphur in solid solution) was used for calibration. It is found that, depending on the annealing temperature, the average grain boundary sulphur concentration ranges from 0.9 to 25.8 ng cm -2 (or 1.7 10 13 to 4.8 10 14 atoms cm -2), i.e. ∼0.015 to ∼0.43 monolayer. Thermodynamic analysis gives a segregation free energy of -97.8 kJ mol -1 and a grain boundary sulphur concentration at saturation of 26.7 ng cm -2 (or 5.0×10 14 atoms cm -2), i.e. ∼0.44 monolayer, in good agreement with previous measurements on this system. The limit of detection of the technique is shown to be as low as 0.24 ng cm -2 (or 4.5×10 12 atoms cm -2), i.e. ∼0.004 monolayer, with a counting time of only 10 min. © 2012 John Wiley & Sons, Ltd.
KW - Auger electron spectroscopy (AES)
KW - microbeam techniques
KW - SIMS
KW - surface analysis
KW - traces
KW - Annealing temperatures
KW - Boundary equilibrium
KW - Bulk samples
KW - Counting time
KW - Grain boundary segregation
KW - Grain-boundary concentration
KW - High resolution
KW - Internal standards
KW - Limit of detection
KW - Microbeam technique
KW - Model system
KW - NanoSIMS
KW - Nickel containing
KW - Nickel grain boundaries
KW - Polished surfaces
KW - Secondary ion mass spectroscopy
KW - Sulphur concentration
KW - Thermo dynamic analysis
KW - Atoms
KW - Auger electron spectroscopy
KW - Grain boundaries
KW - Lunar surface analysis
KW - Monolayers
KW - Nickel
KW - Secondary ion mass spectrometry
KW - Sulfur
KW - Thermoanalysis
KW - Segregation (metallography)
U2 - 10.1002/sia.4806
DO - 10.1002/sia.4806
M3 - Article
SN - 1096-9918
VL - 44
SP - 377
EP - 387
JO - Surface and Interface Analysis
JF - Surface and Interface Analysis
IS - 3
ER -