Raman spectra of hard carbon films and hard carbon films containing secondary elements

T. J. Dines*, D. Tither, A. Dehbi, A. Matthews

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

Raman spectroscopy has been used to investigate the structure and bonding in a number of carbon films prepared by plasma physical vapour deposition and chemical vapour deposition. Several secondary elements have been introduced into the structure of the coatings to observe their influence on the coating-substrate assembly. The spectra show that the samples arc composed of disordered carbon which is mainly sp2-bonded, but with some sp3 bonding. A detailed examination of the low wavenumber region of the specra (< 1,100 cm-1) has revealed evidence for interaction with the silicon substrate. There is also evidence for CH and SiH bonding.

Original languageEnglish
Pages (from-to)225-231
Number of pages7
JournalCarbon
Volume29
Issue number2
DOIs
Publication statusPublished - 1 Jan 1991

Keywords

  • Carbon films
  • Raman spectroscopy

Fingerprint

Dive into the research topics of 'Raman spectra of hard carbon films and hard carbon films containing secondary elements'. Together they form a unique fingerprint.

Cite this