Reactive Intercalation and Oxidation at the Buried Graphene‐Germanium Interface

Philipp Braeuninger-Weimer; Oliver J. Burton; Robert Weatherup; Ruizhi Wang; Pavel Dudin; Barry Brennan; Andrew J. Pollard; Bernhard C. Bayer; Vlad P. Veigang-Radulescu; Jannik C. Meyer; Billy J. Murdoch; Peter J. Cumpson; Stephan Hofmann

doi:10.1063/1.5098351

Reactive Intercalation and Oxidation at the Buried Graphene‐Germanium Interface

Philipp Braeuninger-Weimer, Oliver J. Burton, Robert Weatherup, Ruizhi Wang, Pavel Dudin, Barry Brennan, Andrew J. Pollard, Bernhard C. Bayer, Vlad P. Veigang-Radulescu, Jannik C. Meyer, Billy J. Murdoch, Peter J. Cumpson, Stephan Hofmann

Research output: Contribution to journal › Article › peer-review

Abstract

We explore a number of different electrochemical, wet chemical and gas phase
approaches to study intercalation and oxidation at the buried graphene‐Ge interface. While previous literature focussed on the passivation of the Ge surface by chemical vapour deposited graphene, we show that particularly via electrochemical intercalation in a 0.25 N solution of anhydrous sodium acetate in glacial acetic acid this passivation can be overcome to grow GeO2 under graphene. Angle resolved photoemission spectroscopy, Raman spectroscopy, He ion microscopy and time‐of‐flight secondary ion mass spectrometry show that the mono‐layer graphene remains undamaged and its intrinsic strain is released by the interface oxidation. Graphene acts as a protection layer for the asgrown Ge oxide, and we discuss how these insights can be utilised for new processing
approaches.

Original language	English
Journal	APL Materials
Early online date	17 Jul 2019
DOIs	https://doi.org/10.1063/1.5098351
Publication status	Published - 2019

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10.1063/1.5098351Licence: CC BY

UoMaH: The University of Manchester at Harwell
Lawrence, J. (PI), Burnett, T. (PI), Baker, M. (Researcher), Eastwood, D. (Researcher), Hunt, S. (Researcher), Yan, K. (Researcher), Khan, A. (Researcher), Ma, L. (Researcher), Mirihanage, W. (Researcher), Parlett, C. (Researcher), Freitas, D. (Researcher), Reinhard, C. (Support team), Duggins, D. (Technical team), Lewis-Fell, J. (Technical team), Nonni, S. (Technical team), Rollings, B. (Technical team), Sinclair, L. (Technical team) & Batts, S. (Support team)
1/01/18 → …
Project: Other

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title = "Reactive Intercalation and Oxidation at the Buried Graphene‐Germanium Interface",

abstract = "We explore a number of different electrochemical, wet chemical and gas phaseapproaches to study intercalation and oxidation at the buried graphene‐Ge interface. While previous literature focussed on the passivation of the Ge surface by chemical vapour deposited graphene, we show that particularly via electrochemical intercalation in a 0.25 N solution of anhydrous sodium acetate in glacial acetic acid this passivation can be overcome to grow GeO2 under graphene. Angle resolved photoemission spectroscopy, Raman spectroscopy, He ion microscopy and time‐of‐flight secondary ion mass spectrometry show that the mono‐layer graphene remains undamaged and its intrinsic strain is released by the interface oxidation. Graphene acts as a protection layer for the asgrown Ge oxide, and we discuss how these insights can be utilised for new processingapproaches.",

author = "Philipp Braeuninger-Weimer and Burton, {Oliver J.} and Robert Weatherup and Ruizhi Wang and Pavel Dudin and Barry Brennan and Pollard, {Andrew J.} and Bayer, {Bernhard C.} and Veigang-Radulescu, {Vlad P.} and Meyer, {Jannik C.} and Murdoch, {Billy J.} and Cumpson, {Peter J.} and Stephan Hofmann",

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doi = "10.1063/1.5098351",

language = "English",

journal = "APL Materials",

issn = "2166-532X",

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TY - JOUR

T1 - Reactive Intercalation and Oxidation at the Buried Graphene‐Germanium Interface

AU - Braeuninger-Weimer, Philipp

AU - Burton, Oliver J.

AU - Weatherup, Robert

AU - Wang, Ruizhi

AU - Dudin, Pavel

AU - Brennan, Barry

AU - Pollard, Andrew J.

AU - Bayer, Bernhard C.

AU - Veigang-Radulescu, Vlad P.

AU - Meyer, Jannik C.

AU - Murdoch, Billy J.

AU - Cumpson, Peter J.

AU - Hofmann, Stephan

PY - 2019

Y1 - 2019

N2 - We explore a number of different electrochemical, wet chemical and gas phaseapproaches to study intercalation and oxidation at the buried graphene‐Ge interface. While previous literature focussed on the passivation of the Ge surface by chemical vapour deposited graphene, we show that particularly via electrochemical intercalation in a 0.25 N solution of anhydrous sodium acetate in glacial acetic acid this passivation can be overcome to grow GeO2 under graphene. Angle resolved photoemission spectroscopy, Raman spectroscopy, He ion microscopy and time‐of‐flight secondary ion mass spectrometry show that the mono‐layer graphene remains undamaged and its intrinsic strain is released by the interface oxidation. Graphene acts as a protection layer for the asgrown Ge oxide, and we discuss how these insights can be utilised for new processingapproaches.

AB - We explore a number of different electrochemical, wet chemical and gas phaseapproaches to study intercalation and oxidation at the buried graphene‐Ge interface. While previous literature focussed on the passivation of the Ge surface by chemical vapour deposited graphene, we show that particularly via electrochemical intercalation in a 0.25 N solution of anhydrous sodium acetate in glacial acetic acid this passivation can be overcome to grow GeO2 under graphene. Angle resolved photoemission spectroscopy, Raman spectroscopy, He ion microscopy and time‐of‐flight secondary ion mass spectrometry show that the mono‐layer graphene remains undamaged and its intrinsic strain is released by the interface oxidation. Graphene acts as a protection layer for the asgrown Ge oxide, and we discuss how these insights can be utilised for new processingapproaches.

U2 - 10.1063/1.5098351

DO - 10.1063/1.5098351

M3 - Article

SN - 2166-532X

JO - APL Materials

JF - APL Materials

ER -

Reactive Intercalation and Oxidation at the Buried Graphene‐Germanium Interface

Abstract

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UoMaH: The University of Manchester at Harwell

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