Abstract
Morrison presented an improved ion source for magnetron sputtering in 1982. He claimed that having a magnetically hidden anode placed in a magnetron sputtering system, as shown in Fig 1, could double the plasma density and provided a more uniform plasma through the chamber. This system made it possible to get effective predeposition cleaning and sufficient ion bombardment towards the biased substrates during the coating process.
| Original language | English |
|---|---|
| Pages | 36-38 |
| Number of pages | 3 |
| Volume | 17 |
| No. | 11 |
| Specialist publication | Finishing |
| Publication status | Published - 1 Nov 1993 |
Keywords
- ion beams
- plasma spraying
- protective coatings
- sputter deposition