Reduction of boron diffusion in silicon-germanium by fluorine implantation

H. A W El Mubarek, P. Ashburn

    Research output: Contribution to journal › Article › peer-review

    Fingerprint

    Dive into the research topics of 'Reduction of boron diffusion in silicon-germanium by fluorine implantation'. Together they form a unique fingerprint.

    Biochemistry, Genetics and Molecular Biology