Scanning probe lithography on graphene

Soeren Neubeck; Frank Freitag; Rui Yang; Kostya S. Novoselov

doi:10.1002/pssb.201000186

Scanning probe lithography on graphene

Soeren Neubeck, Frank Freitag, Rui Yang, Kostya S. Novoselov

Research output: Contribution to journal › Article › peer-review

Abstract

In this paper, we want to outline the principles of how scanning probe lithography on graphene is performed. We will show several examples of structures etched in graphene using this technique, including an example of a nanoelectronic device. In the last part, we present data regarding the oxidation kinetics when performing scanning probe lithography on graphite (HOPG).Two lines oxidized in graphene using scanning probe lithography. The left line (indicated by the arrow) is only 30nm wide, indicating that this technique has good enough resolution to create nanoelectronic device structures. © 2010 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Original language	English
Pages (from-to)	2904-2908
Number of pages	4
Journal	Physica Status Solidi (B) Basic Research
Volume	247
Issue number	11-12
DOIs	https://doi.org/10.1002/pssb.201000186
Publication status	Published - Dec 2010

Keywords

Graphene
Local anodic oxidation
Nanostructures
Oxidation kinetics

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10.1002/pssb.201000186

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title = "Scanning probe lithography on graphene",

abstract = "In this paper, we want to outline the principles of how scanning probe lithography on graphene is performed. We will show several examples of structures etched in graphene using this technique, including an example of a nanoelectronic device. In the last part, we present data regarding the oxidation kinetics when performing scanning probe lithography on graphite (HOPG).Two lines oxidized in graphene using scanning probe lithography. The left line (indicated by the arrow) is only 30nm wide, indicating that this technique has good enough resolution to create nanoelectronic device structures. {\textcopyright} 2010 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.",

keywords = "Graphene, Local anodic oxidation, Nanostructures, Oxidation kinetics",

author = "Soeren Neubeck and Frank Freitag and Rui Yang and Novoselov, {Kostya S.}",

year = "2010",

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doi = "10.1002/pssb.201000186",

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volume = "247",

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AU - Neubeck, Soeren

AU - Freitag, Frank

AU - Yang, Rui

AU - Novoselov, Kostya S.

PY - 2010/12

Y1 - 2010/12

N2 - In this paper, we want to outline the principles of how scanning probe lithography on graphene is performed. We will show several examples of structures etched in graphene using this technique, including an example of a nanoelectronic device. In the last part, we present data regarding the oxidation kinetics when performing scanning probe lithography on graphite (HOPG).Two lines oxidized in graphene using scanning probe lithography. The left line (indicated by the arrow) is only 30nm wide, indicating that this technique has good enough resolution to create nanoelectronic device structures. © 2010 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

AB - In this paper, we want to outline the principles of how scanning probe lithography on graphene is performed. We will show several examples of structures etched in graphene using this technique, including an example of a nanoelectronic device. In the last part, we present data regarding the oxidation kinetics when performing scanning probe lithography on graphite (HOPG).Two lines oxidized in graphene using scanning probe lithography. The left line (indicated by the arrow) is only 30nm wide, indicating that this technique has good enough resolution to create nanoelectronic device structures. © 2010 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

KW - Graphene

KW - Local anodic oxidation

KW - Nanostructures

KW - Oxidation kinetics

U2 - 10.1002/pssb.201000186

DO - 10.1002/pssb.201000186

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JO - Physica Status Solidi (B) Basic Research

JF - Physica Status Solidi (B) Basic Research

IS - 11-12

ER -

Scanning probe lithography on graphene

Abstract

Keywords

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