Selective deposition of cobalt sulfide nanostructured thin films from single-source precursors

Karthik Ramasamy, Mohammad A. Malik, James Raftery, Floriana Tuna, Paul O'brien

    Research output: Contribution to journalArticlepeer-review

    Abstract

    The cobalt(III) complexes of 1,1,5,5-tetramethyl- and 1,1,5,5-tetraethyl-2, 4-dithiobiuret and the cobalt(II) complex of 1,1,5,5-tetra-iso-propyl-2- thiobiuret have been synthesized. The single-crystal X-ray structure of the thiocyanide (1) and cobalt tetrachlorate (2) salts of the parent cyclized ligand, together with complexes [Co{N(SCNMe2)2} 3] (3), [Co{N(SCNEt2)2}3] (4) and [Co{N(SOCNiPr2)2}2] (5) have been determined. The thermal decomposition of 3, 4, and 5 was studied. The complexes were used as single source precursors for the deposition of cobalt sulfide thin films by aerosol assisted chemical vapor deposition (AACVD). The X-ray diffraction (XRD) of the deposited films showed hexagonal Co1-xS from complexes (3) and (4) whereas complex (5) gave a mixture of cubic and hexagonal Co4S3. The morphology of films was characterized by scanning electron microscope (SEM) and showed rod like crystallites from 3, granular crystallites from 4 and stalagmitic structures from 5. Transmission electron microscopy (TEM) of the samples obtained from thin films from 3 and 4 show that the films are composed of hexagonal nanoplates with nanocubes from 5. Magnetic measurements showed the para or ferro-magnetic behavior from crystallites. The mechanism for decomposition of precursors to the cobalt sulfide was studied by pyrolysis gas chromatography (Py-GC-MS). © 2010 American Chemical Society.
    Original languageEnglish
    Pages (from-to)4919-4930
    Number of pages11
    JournalChemistry of Materials
    Volume22
    Issue number17
    DOIs
    Publication statusPublished - 14 Sept 2010

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