Separating dipolar broadening from the intrinsic switching field distribution in perpendicular patterned media

O. Hellwig; A. Berger; T. Thomson; E. Dobisz; Z. Z. Bandic; H. Yang; D. S. Kercher; E. E. Fullerton

doi:10.1063/1.2730744

Separating dipolar broadening from the intrinsic switching field distribution in perpendicular patterned media

O. Hellwig, A. Berger, T. Thomson, E. Dobisz, Z. Z. Bandic, H. Yang, D. S. Kercher, E. E. Fullerton

Research output: Contribution to journal › Article › peer-review

Abstract

A critical requirement for bit patterned media applications is the control and minimization of the switching field distribution (SFD). Here, we use the ΔH(M,ΔM) method to separate dipolar interactions due to neighbor islands from the intrinsic SFD by measuring a series of partial reversal curves of perpendicular anisotropy Co/Pd based multilayer films deposited onto prepatterned Si substrates. For a 100-nm-period island array the dipolar broadening contributes 22% to the observed SFD. For a 45-nm-period array this value increases to 31%. These results highlight the importance of quantifying long-range dipolar interactions for determining the intrinsic SFD of patterned media. © 2007 American Institute of Physics.

Original language	English
Article number	162516
Journal	Applied Physics Letters
Volume	90
Issue number	16
DOIs	https://doi.org/10.1063/1.2730744
Publication status	Published - 2007

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title = "Separating dipolar broadening from the intrinsic switching field distribution in perpendicular patterned media",

abstract = "A critical requirement for bit patterned media applications is the control and minimization of the switching field distribution (SFD). Here, we use the ΔH(M,ΔM) method to separate dipolar interactions due to neighbor islands from the intrinsic SFD by measuring a series of partial reversal curves of perpendicular anisotropy Co/Pd based multilayer films deposited onto prepatterned Si substrates. For a 100-nm-period island array the dipolar broadening contributes 22% to the observed SFD. For a 45-nm-period array this value increases to 31%. These results highlight the importance of quantifying long-range dipolar interactions for determining the intrinsic SFD of patterned media. {\textcopyright} 2007 American Institute of Physics.",

author = "O. Hellwig and A. Berger and T. Thomson and E. Dobisz and Bandic, {Z. Z.} and H. Yang and Kercher, {D. S.} and Fullerton, {E. E.}",

note = "Hellwig, O. Berger, A. Thomson, T. Dobisz, E. Bandic, Z. Z. Yang, H. Kercher, D. S. Fullerton, E. E.",

year = "2007",

doi = "10.1063/1.2730744",

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journal = "Applied Physics Letters",

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publisher = "American Institute of Physics",

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T1 - Separating dipolar broadening from the intrinsic switching field distribution in perpendicular patterned media

AU - Hellwig, O.

AU - Berger, A.

AU - Thomson, T.

AU - Dobisz, E.

AU - Bandic, Z. Z.

AU - Yang, H.

AU - Kercher, D. S.

AU - Fullerton, E. E.

N1 - Hellwig, O. Berger, A. Thomson, T. Dobisz, E. Bandic, Z. Z. Yang, H. Kercher, D. S. Fullerton, E. E.

PY - 2007

Y1 - 2007

N2 - A critical requirement for bit patterned media applications is the control and minimization of the switching field distribution (SFD). Here, we use the ΔH(M,ΔM) method to separate dipolar interactions due to neighbor islands from the intrinsic SFD by measuring a series of partial reversal curves of perpendicular anisotropy Co/Pd based multilayer films deposited onto prepatterned Si substrates. For a 100-nm-period island array the dipolar broadening contributes 22% to the observed SFD. For a 45-nm-period array this value increases to 31%. These results highlight the importance of quantifying long-range dipolar interactions for determining the intrinsic SFD of patterned media. © 2007 American Institute of Physics.

AB - A critical requirement for bit patterned media applications is the control and minimization of the switching field distribution (SFD). Here, we use the ΔH(M,ΔM) method to separate dipolar interactions due to neighbor islands from the intrinsic SFD by measuring a series of partial reversal curves of perpendicular anisotropy Co/Pd based multilayer films deposited onto prepatterned Si substrates. For a 100-nm-period island array the dipolar broadening contributes 22% to the observed SFD. For a 45-nm-period array this value increases to 31%. These results highlight the importance of quantifying long-range dipolar interactions for determining the intrinsic SFD of patterned media. © 2007 American Institute of Physics.

U2 - 10.1063/1.2730744

DO - 10.1063/1.2730744

M3 - Article

SN - 0003-6951

VL - 90

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 16

M1 - 162516

ER -

Separating dipolar broadening from the intrinsic switching field distribution in perpendicular patterned media

Abstract

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