Sol-gel organic-inorganic composites for 3-D holographic lithography of photonic crystals with submicron periodicity

Kalaichelvi Saravanamuttu; Christopher F. Blanford; David N. Sharp; Emma R. Dedman; Andrew J. Turberfield; Robert G. Denning

doi:10.1021/cm034015i

Sol-gel organic-inorganic composites for 3-D holographic lithography of photonic crystals with submicron periodicity

Kalaichelvi Saravanamuttu, Christopher F. Blanford, David N. Sharp, Emma R. Dedman, Andrew J. Turberfield, Robert G. Denning

Research output: Contribution to journal › Article › peer-review

Abstract

We demonstrate that silica-acrylate materials doped with transition metal (Zr, Ti) oxide nanoparticles are suitable for the three-dimensional holographic lithography of photonic crystals with submicron periodicity and large inorganic contents. By careful choice of inorganic components, such composites could provide a route to the template-free, direct lithography of three-dimensionally ordered structures with high refractive-index contrast, submicron periodicity, and band gaps in the visible and infrared regions.

Original language	English
Pages (from-to)	2301-2304
Number of pages	3
Journal	Chemistry of Materials
Volume	15
Issue number	12
DOIs	https://doi.org/10.1021/cm034015i
Publication status	Published - 17 Jun 2003

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title = "Sol-gel organic-inorganic composites for 3-D holographic lithography of photonic crystals with submicron periodicity",

abstract = "We demonstrate that silica-acrylate materials doped with transition metal (Zr, Ti) oxide nanoparticles are suitable for the three-dimensional holographic lithography of photonic crystals with submicron periodicity and large inorganic contents. By careful choice of inorganic components, such composites could provide a route to the template-free, direct lithography of three-dimensionally ordered structures with high refractive-index contrast, submicron periodicity, and band gaps in the visible and infrared regions.",

author = "Kalaichelvi Saravanamuttu and Blanford, {Christopher F.} and Sharp, {David N.} and Dedman, {Emma R.} and Turberfield, {Andrew J.} and Denning, {Robert G.}",

year = "2003",

month = jun,

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doi = "10.1021/cm034015i",

language = "English",

volume = "15",

pages = "2301--2304",

journal = "Chemistry of Materials",

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publisher = "American Chemical Society",

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TY - JOUR

T1 - Sol-gel organic-inorganic composites for 3-D holographic lithography of photonic crystals with submicron periodicity

AU - Saravanamuttu, Kalaichelvi

AU - Blanford, Christopher F.

AU - Sharp, David N.

AU - Dedman, Emma R.

AU - Turberfield, Andrew J.

AU - Denning, Robert G.

PY - 2003/6/17

Y1 - 2003/6/17

N2 - We demonstrate that silica-acrylate materials doped with transition metal (Zr, Ti) oxide nanoparticles are suitable for the three-dimensional holographic lithography of photonic crystals with submicron periodicity and large inorganic contents. By careful choice of inorganic components, such composites could provide a route to the template-free, direct lithography of three-dimensionally ordered structures with high refractive-index contrast, submicron periodicity, and band gaps in the visible and infrared regions.

AB - We demonstrate that silica-acrylate materials doped with transition metal (Zr, Ti) oxide nanoparticles are suitable for the three-dimensional holographic lithography of photonic crystals with submicron periodicity and large inorganic contents. By careful choice of inorganic components, such composites could provide a route to the template-free, direct lithography of three-dimensionally ordered structures with high refractive-index contrast, submicron periodicity, and band gaps in the visible and infrared regions.

U2 - 10.1021/cm034015i

DO - 10.1021/cm034015i

M3 - Article

SN - 0897-4756

VL - 15

SP - 2301

EP - 2304

JO - Chemistry of Materials

JF - Chemistry of Materials

IS - 12

ER -

Sol-gel organic-inorganic composites for 3-D holographic lithography of photonic crystals with submicron periodicity

Abstract

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