Sputter-deposited nitrides for oxidation protection in a steam environment at high temperatures

Zhaohe Gao; Justyna Kulczyk-Malecka; Etienne Bousser; Xun Zhang; Ying Chen; Han Liu; Peter Kelly; Ping Xiao

doi:10.1016/j.tsf.2019.137439

Sputter-deposited nitrides for oxidation protection in a steam environment at high temperatures

Zhaohe Gao, Justyna Kulczyk-Malecka, Etienne Bousser, Xun Zhang, Ying Chen, Han Liu, Peter Kelly, Ping Xiao

Manchester Metropolitan University (MMU)

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Abstract

The oxidation behaviours of ZrN, TiN and TiSiN in a steam environment in the high temperature range of 600–900 °C have been studied and compared. Nitride coatings were deposited by reactive magnetron sputtering onto Zirc – alloy and silicon wafer substrates. The steam oxidation test was performed in order to investigate oxidation resistance in the Loss – of – Coolant Accident (LOCA) scenario in Light Water Reactor applications. It was found that TiSiN showed better oxidation resistance in a steam environment than ZrN and TiN. Coatings in the as-deposited state and after thermal exposure were characterised using focused ion beam, transmission electron microscopy and X-ray diffraction to evaluate microstructure and phases present in the coatings.

Original language	English
Pages (from-to)	137439
Journal	Thin Solid Films
Volume	688
Early online date	24 Jul 2019
DOIs	https://doi.org/10.1016/j.tsf.2019.137439
Publication status	Published - 1 Oct 2019

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Manuscript ZrN TiN for pure_Accepted author manuscript, 1.84 MBLicence: CC BY-NC-ND

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title = "Sputter-deposited nitrides for oxidation protection in a steam environment at high temperatures",

abstract = "The oxidation behaviours of ZrN, TiN and TiSiN in a steam environment in the high temperature range of 600–900 °C have been studied and compared. Nitride coatings were deposited by reactive magnetron sputtering onto Zirc – alloy and silicon wafer substrates. The steam oxidation test was performed in order to investigate oxidation resistance in the Loss – of – Coolant Accident (LOCA) scenario in Light Water Reactor applications. It was found that TiSiN showed better oxidation resistance in a steam environment than ZrN and TiN. Coatings in the as-deposited state and after thermal exposure were characterised using focused ion beam, transmission electron microscopy and X-ray diffraction to evaluate microstructure and phases present in the coatings.",

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T1 - Sputter-deposited nitrides for oxidation protection in a steam environment at high temperatures

AU - Gao, Zhaohe

AU - Kulczyk-Malecka, Justyna

AU - Bousser, Etienne

AU - Zhang, Xun

AU - Chen, Ying

AU - Liu, Han

AU - Kelly, Peter

AU - Xiao, Ping

PY - 2019/10/1

Y1 - 2019/10/1

N2 - The oxidation behaviours of ZrN, TiN and TiSiN in a steam environment in the high temperature range of 600–900 °C have been studied and compared. Nitride coatings were deposited by reactive magnetron sputtering onto Zirc – alloy and silicon wafer substrates. The steam oxidation test was performed in order to investigate oxidation resistance in the Loss – of – Coolant Accident (LOCA) scenario in Light Water Reactor applications. It was found that TiSiN showed better oxidation resistance in a steam environment than ZrN and TiN. Coatings in the as-deposited state and after thermal exposure were characterised using focused ion beam, transmission electron microscopy and X-ray diffraction to evaluate microstructure and phases present in the coatings.

AB - The oxidation behaviours of ZrN, TiN and TiSiN in a steam environment in the high temperature range of 600–900 °C have been studied and compared. Nitride coatings were deposited by reactive magnetron sputtering onto Zirc – alloy and silicon wafer substrates. The steam oxidation test was performed in order to investigate oxidation resistance in the Loss – of – Coolant Accident (LOCA) scenario in Light Water Reactor applications. It was found that TiSiN showed better oxidation resistance in a steam environment than ZrN and TiN. Coatings in the as-deposited state and after thermal exposure were characterised using focused ion beam, transmission electron microscopy and X-ray diffraction to evaluate microstructure and phases present in the coatings.

U2 - 10.1016/j.tsf.2019.137439

DO - 10.1016/j.tsf.2019.137439

M3 - Article

SN - 0040-6090

VL - 688

SP - 137439

JO - Thin Solid Films

JF - Thin Solid Films

ER -

Sputter-deposited nitrides for oxidation protection in a steam environment at high temperatures

Abstract

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