Step and point defect effects on TiO2(100) reactivity

C. A. Muryn*, P. J. Hardman, J. J. Crouch, G. N. Raiker, G. Thornton, D. S.L. Law

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

The influence of steps and point defects on the reactivity of TiO2(100) to H2O has been examined using photoemission spectroscopy. A vicinal surface was prepared by polishing a sample 2.6 ± 0.1° off the (100) plane towards [001]. Point defects in the form of oxygen vacancies were introduced onto the stepped and planar 1 × 1 stoichiometric (100) surfaces by thermal annealing, a 1 × 3 ordered defect array being formed. The interaction of H2O with TiO2(100) at 130 K and 293 K is found to be independent of O vacancy and step density. H2O adsorbs molecularly at 130 K and dissociates to form OH at 293 K.

Original languageEnglish
Pages (from-to)747-752
Number of pages6
JournalSurface Science
Volume251-252
Issue numberC
DOIs
Publication statusPublished - 1 Jul 1991

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