Abstract
The influence of steps and point defects on the reactivity of TiO2(100) to H2O has been examined using photoemission spectroscopy. A vicinal surface was prepared by polishing a sample 2.6 ± 0.1° off the (100) plane towards [001]. Point defects in the form of oxygen vacancies were introduced onto the stepped and planar 1 × 1 stoichiometric (100) surfaces by thermal annealing, a 1 × 3 ordered defect array being formed. The interaction of H2O with TiO2(100) at 130 K and 293 K is found to be independent of O vacancy and step density. H2O adsorbs molecularly at 130 K and dissociates to form OH at 293 K.
Original language | English |
---|---|
Pages (from-to) | 747-752 |
Number of pages | 6 |
Journal | Surface Science |
Volume | 251-252 |
Issue number | C |
DOIs | |
Publication status | Published - 1 Jul 1991 |