Structural and compositional properties of ternary iron-cobalt silicides fabricated by ion beam synthesis

M. A. Harry, M. S. Finney, G. Curello, K. J. Reeson, Z. Yang, R. M. Gwilliam, B. J. Sealy

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Ternary silicide layers were fabricated by implantation of iron and cobalt into silicon (100) wafers. Two sets of samples with different Fe:Co ratios were prepared. In the first set cobalt was implanted first followed by iron and the implant order was reversed in the second set. In all cases the total implanted dose (Fe+Co) was 5×10 17 cm 2 . The physical properties of the synthesised layers were investigated by Rutherford backscattering spectrometry (RBS), cross-sectional transmission electron microscopy (XTEM), x-ray diffraction (XRD) and x-ray photoelectron spectroscopy (XPS) depth profiling. The results indicate that the order in which the ion species was implanted was crucial to the subsequent development of the synthesised layer. Samples implanted with iron first showed no significant improvement of crystallinity with increasing anneal temperature as measured by ion channelling. However, there was a large improvement of crystal quality proportional to the anneal temperature for the samples implanted with cobalt first. Samples with cobalt doses ≥ 2.5×10 17 cm -2 , where cobalt was implanted first, showed segregation into separate iron and cobalt rich layers.
Original languageUndefined
Title of host publicationIon Beam Modification of Materials
EditorsJ.S. Williams, R.G. Elliman, M.C. Ridgway
PublisherElsevier BV
Number of pages6
ISBN (Print)978-0-444-82334-2
Publication statusPublished - 1996

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