Substrate temperature monitoring in plasma assisted processes

V. Korotchenko*, A. Matthews

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

Temperature monitoring of substrates during processing is crucial to product reproducibility and quality control in all plasma assisted techniques. The presence of high voltages and the need to ensure electrical insulation are two features of these processes which can make conventional temperature monitoring difficult, added to which are the special problems associated with the presence of the glow discharge. Recently developed techniques utilising two colour infra-red fibre optic devices are shown to offer advantages, particularly in coping with emissivity variations. Tests using a system based on these principles are reported. The means whereby these devices can be incorporated within plasma based systems are discussed, together with their special benefits in terms of process control.

Original languageEnglish
Pages (from-to)61-65
Number of pages5
JournalVacuum
Volume36
Issue number1-3
DOIs
Publication statusPublished - 1 Jan 1986

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