The adsorption of methanol on NiOx Ni{110}

H. E. Sanders, P. Gardner, D. A. King

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    The adsorption of methanol on two different thin film preparations of NiOx grown on Ni{110} has been studied using reflection absorption infrared spectroscopy (RAIRS). The thin oxide films have been prepared at 300 and 570-650 K and are referred to as the low-T and high-T oxides, respectively. Adsorption on both these films at 130 K is mainly associative. In each case two types of adsorbed methanol are observed due to adsorption in two slightly different chemical environments. Both of these species are tilted with respect to the surface normal to roughly the same extent. Molecular desorption from both surfaces is observed between ∼ 250-270 K. On the high-T oxide, however, a small concentration of a more strongly bound methoxy species is observed. These results, are discussed in relation to a recent study of methanol on NiO{100} Mo{100}. © 1995.
    Original languageEnglish
    Pages (from-to)1496-1502
    Number of pages6
    JournalSurface Science
    Publication statusPublished - 1 Jul 1995


    • Alcohols
    • Infrared absorption spectroscopy
    • Nickel
    • Nickel oxides
    • Single crystal surfaces
    • Vibrations of adsorbed molecules


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