The chemical vapor deposition of nickel phosphide or selenide thin films from a single precursor

Arunkumar Panneerselvam; Mohammad A. Malik; Mohammad Afzaal; Paul O'Brien; Madeleine Helliwell

doi:10.1021/ja078202j

The chemical vapor deposition of nickel phosphide or selenide thin films from a single precursor

Arunkumar Panneerselvam, Mohammad A. Malik, Mohammad Afzaal, Paul O'Brien, Madeleine Helliwell

Research output: Contribution to journal › Article › peer-review

Abstract

Nickel phosphide, nickel selenide thin films and their heterostructure (Ni0.85Se/Ni2P) were deposited from a newly synthesized single source precursor {Ni[iPr2P(S)NP(Se)iPr2]2} just by altering the deposition temperature using CVD. Copyright © 2008 American Chemical Society.

Original language	English
Pages (from-to)	2420-2421
Number of pages	1
Journal	Journal of the American Chemical Society
Volume	130
Issue number	8
DOIs	https://doi.org/10.1021/ja078202j
Publication status	Published - 27 Feb 2008

Keywords

METAL PHOSPHIDES
SEMICONDUCTORS
COMPLEXES
ELECTRODEPOSITION
CHEMISTRY
CATALYSTS
GROWTH
SE

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10.1021/ja078202j

CCDC 607610: Experimental Crystal Structure Determination
Panneerselvam, A. (Contributor), Malik, M. (Contributor), Afzaal, M. (Contributor), O'Brien, P. (Contributor) & Helliwell, M. (Contributor), Cambridge Crystallographic Data Centre, 1 Jan 2008
DOI: 10.5517/ccnd8bm, http://www.ccdc.cam.ac.uk/services/structure_request?id=doi:10.5517/ccnd8bm&sid=DataCite
Dataset

Cite this

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title = "The chemical vapor deposition of nickel phosphide or selenide thin films from a single precursor",

abstract = "Nickel phosphide, nickel selenide thin films and their heterostructure (Ni0.85Se/Ni2P) were deposited from a newly synthesized single source precursor {Ni[iPr2P(S)NP(Se)iPr2]2} just by altering the deposition temperature using CVD. Copyright {\textcopyright} 2008 American Chemical Society.",

keywords = "METAL PHOSPHIDES, SEMICONDUCTORS, COMPLEXES, ELECTRODEPOSITION, CHEMISTRY, CATALYSTS, GROWTH, SE",

author = "Arunkumar Panneerselvam and Malik, {Mohammad A.} and Mohammad Afzaal and Paul O'Brien and Madeleine Helliwell",

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year = "2008",

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doi = "10.1021/ja078202j",

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T1 - The chemical vapor deposition of nickel phosphide or selenide thin films from a single precursor

AU - Panneerselvam, Arunkumar

AU - Malik, Mohammad A.

AU - Afzaal, Mohammad

AU - O'Brien, Paul

AU - Helliwell, Madeleine

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PY - 2008/2/27

Y1 - 2008/2/27

N2 - Nickel phosphide, nickel selenide thin films and their heterostructure (Ni0.85Se/Ni2P) were deposited from a newly synthesized single source precursor {Ni[iPr2P(S)NP(Se)iPr2]2} just by altering the deposition temperature using CVD. Copyright © 2008 American Chemical Society.

AB - Nickel phosphide, nickel selenide thin films and their heterostructure (Ni0.85Se/Ni2P) were deposited from a newly synthesized single source precursor {Ni[iPr2P(S)NP(Se)iPr2]2} just by altering the deposition temperature using CVD. Copyright © 2008 American Chemical Society.

KW - METAL PHOSPHIDES

KW - SEMICONDUCTORS

KW - COMPLEXES

KW - ELECTRODEPOSITION

KW - CHEMISTRY

KW - CATALYSTS

KW - GROWTH

KW - SE

U2 - 10.1021/ja078202j

DO - 10.1021/ja078202j

M3 - Article

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JO - Journal of the American Chemical Society

JF - Journal of the American Chemical Society

IS - 8

ER -

The chemical vapor deposition of nickel phosphide or selenide thin films from a single precursor

Abstract

Keywords

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Datasets

CCDC 607610: Experimental Crystal Structure Determination

Cite this