The enhancement of high speed pHEMT device for IoT applications

M. Mohamad Isa, N. Ahmad, Siti S.Mat Isa, Muhammad M. Ramli, N. Khalid, N. I.M. Nor, S. R. Kasjoo, M. Missous

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

We report the enhancements on pHEMT epilayers to suite the high speed applications for IoT. Presented here are the DC and RF comparisons between XMBE #109 as the baseline of high speed pHEMT and VMBE #2100 as the enhanced epitaxial layer. The Hall data from Van der Pauw measurement shows higher sheet carrier concentration is observed on the improved epitaxial layer devices. The DC comparisons between the devices from both epilayers verified that the enhanced epitaxial layer demonstrates low leakage-high breakdown characteristics. Improvement of transconductance and output current density also been observed from the VMBE #2100 epitaxial layer. The RF characteristics, however, show comparable fT of 25 GHz. In short, this will facilitates the implementation of high speed circuits, including high speed broadband systems for IoT applications.

Original languageEnglish
Title of host publication2016 3rd International Conference on Electronic Design, ICED 2016
PublisherIEEE
Pages35-39
Number of pages5
ISBN (Electronic)9781509021604
DOIs
Publication statusPublished - 2017
Event3rd International Conference on Electronic Design, - Phuket, Thailand
Duration: 11 Aug 201612 Aug 2016

Publication series

Name2016 3rd International Conference on Electronic Design, ICED 2016

Conference

Conference3rd International Conference on Electronic Design,
Abbreviated titleICED 2016
Country/TerritoryThailand
CityPhuket
Period11/08/1612/08/16

Keywords

  • high frequency
  • high speed
  • InP/InAlAs/InGaAs
  • pHEMT

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