The influence of process system characteristics on the uniformity of ion plated titanium nitride coatings

K. S. Fancey, M. Williams, A. Leyland, A. Matthews

Research output: Contribution to journalArticlepeer-review

Abstract

A thermionically enhanced reactive ion plating system has been studied, to determine the influence of various process variables. In particular, the spatial variations of thickness and structure are investigated, the former being used to evaluate parameters generated from simple mathematical relationships. The observed effects are explained by reference to phenomena such as the formation of a ‘virtual source’ above the evaporant melt pool and the influence of vapour directionality and thermalisation. The results show that vapour emission characteristics can be influenced by partial contamination of the evaporative source and also by the substrate biasing configuration. In the latter case, the plasma potential was raised sufficiently to allow TiN to be successfully ion plated onto earthed substrates.
Original languageEnglish
Pages (from-to)235-240
Number of pages6
JournalVacuum
Volume43
Issue number3
DOIs
Publication statusPublished - Mar 1992

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